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In this paper we will discuss the performance of delta-doped CCDs in UV and EUV, our in-house thinning capability, bonding approaches for producing flat focal plane arrays, and in-house capabilities of directly applied antireflection coatings.
A method is provided for fabricating a backside-illuminated photodetector in which a device wafer is joined to a readout wafer in an IC hybridization step. Before the IC hybridization step, the device layer is defined in the device wafer, and an LPCVD layer is formed over the device layer. The LPCVD layer may be a passivation layer, an antireflection coating, or both. The side of the device wafer having the LPCVD layer is bonded to a handle wafer, the IC is hybridized by mating the device wafer to the readout wafer, and the handle wafer is then removed, exposing the LPCVD layer. Because the LPCVD layer is formed before the active devices are fabricated, it can be made by high-temperature techniques for deposition and processing. Accordingly, a layer of high quality can be fabricated without any hazard to the active devices.
Solar radiation reaching photovoltaic (PV) modules on a 1-axis tracking system can be measured by reference cells or thermopiles. The former is often biased due to the reflection of solar radiation by the glass cover of the PV. The uncertainty can be moderated by applying a correction factor, as a function of solar incident angle and the refractive index of the glass, to the measurement. On the other hand, solar radiation on the inclined PV panels can be computed by transposition models using global horizontal irradiance (GHI) observations from thermopiles. This study examines the models and measurements to estimate solar radiation for 1-axis tracking modules at National Renewable Energy Laboratory’s (NREL’s) Solar Radiation Research Laboratory (SRRL). The 1-minute plane-of-array (POA) irradiances in 2019 are computed using the observed GHIs and a transposition model developed by Perez et al. The POA irradiances are compared with the observation by an IMT reference cell and a Kipp & Zonen CM Pyranometer 22 (CMP22) thermopile. For SRRL’s 1-axis tracking system with the annual solar energy of 2323.9 kWh/m2, the POA irradiance is overestimated by ~70 kWh/m2 using the transposition model. This bias is reduced by more than 50% using the IMT measurements calibrated by a correction factor for a PV surface of antireflection coated glass.
An antireflection overcoat for opaque baffle coatings in the far infrared (FIR)/submillimeter region was made from a simple Teflon spray-on lubricant. The Teflon overcoat reduced the specular reflectance of four different opaque coatings by nearly a factor of two. Analysis, based on the interference term of a reflecting-layer model, indicates that in the submillimeter region the reduced reflectance depends primarily on the refractive index of the overcoat and very little on its thickness.
An antireflection overcoat for opaque baffle coatings in the far-IR/submillimeter region has been made from a simple Teflon spray-on lubricant. The Teflon overcoat reduced the specular reflectance of four different opaque coatings by nearly a factor or 2. Analysis, based on the interference term of a reflecting-layer model, indicates that in the submillimeter region the reduced reflectance depends primarily on the refractive index of the overcoat and very little on its thickness.
Characterization of photovoltaic (PV) module materials throughout different stages of service life is crucial to understanding and improving the durability of these materials. Currently the large-scale of PV modules (>1 m 2 ) is imbalanced with the small-scale of most materials characterization tools (= 1 cm 2 ). Furthermore, understanding degradation mechanisms often requires a combination of multiple characterization techniques. Here, we present adaptations of three standard materials characterization techniques to enable mapping characterization over moderate sample areas (=25 cm 2 ). Contact angle, ellipsometry, and UV-Vis spectroscopy are each adapted and demonstrated on two representative samples: a commercial multi-functional coating for PV glass and an oxide combinatorial sample library. Best practices are discussed for adapting characterization techniques for large area mapping and combining mapping information from multiple techniques.
At the time of our Second LDEF Post-Retrieval Symposium report, we had completed cleaning and measuring the post flight spectral performance of all of the samples except for the fused silica substrate with an antireflection (SiO2/TiO2) coating. As was documented in that report, after cleaning, all of the samples returned to their original pre-flight performance, with the exception of the fused silica anti-reflectance coated sample, which had significant degraded performance. All normal methods of removing the contaminant from the surface of this sample failed except for oxygen plasma etch. At the time of the previous report, we had only exposed the sample to three hours of plasma etch. We have since continued the plasma etch for a total of 32 hours, after which time, the transmission of the sample almost reached its pre-flight values. The peak areas of the transmission curves remained shifted approximately 150 nm. Of interest is the fact that the control samples, which hadn't flown, did not exhibit any spectral shifting. In summary, after the 6 yr exposure to the space environment, all of the coatings and substrates returned to their pre-flight performance after cleaning, with the exception of the antireflection coated fused silica sample. On this sample, the spectral transmission curves shifted approximately 150 nm.
For many optics technologies, such as display screens, solar cells, laser systems, and eyeglasses, antireflective (AR) coatings are well integrated; these applications frequently benefit from the ability to function as broadband AR. Here, in this work, all-glass metasurfaces are reported on, exhibiting a measured reflectance of 0.18% ± 0.23% per interface, averaged across wavelengths spanning from 350 nm (ultraviolet) to 2350 nm (mid-infrared); to the best of knowledge, this is the first-ever demonstration of an AR layer capable of this. Furthermore, acceptance angles up to 100° (angle of incidence = ±50°) results in % R < 0.6% per interface over the band 350–1300 nm for P-polarization and S-polarization, with wavelength averaged reflectance values 0.04% ± 0.05% and 0.11% ± 0.15%, respectively – another technological first. The process advancements presented here allow for reflectance suppression over a broad range of wavelengths, angles, and polarizations.
Optic processing advances have shifted system limitations, with current constraints consisting of antireflective (AR) coatings applied to optics and the inability to reduce size, weight, and price. Metasurfaces, and more broadly metaoptics, provide an avenue to overcome these limitations. The ability to generate substrate-engraved metasurfaces that can be tailored is demonstrated within a broad design space to satisfy large-area AR applications for bandpass or broadband needs, demonstrating an optically equivalent surface roughness standard deviation of only 5 Å. Using an advanced nanoparticle masking approach, two metasurfaces are fabricated: 1) vertical sidewall nanofeature metasurface (MS) for AR applications at 351 nm, and 2) sloped sidewall MS designed for broadband AR applications. For the 351 nm MS, the reflectance is measured to be 0.127%. In the case of the sloped sidewall MS, the reflectance is measured to be <0.25% over 400–700 nm and <1% over 400–1100 nm. To the best of the authors’ knowledge, this is the first demonstration of a broadband AR capable of this performance. The tunability of these structures, with a parameter space spanning even more remarkable designs such as broader bands and acceptance angles, coupled with high laser-induced damage durability and mechanical robustness, displays the strength of metasurfaces for AR applications.
Coating thickness not critical. Polytetrafluoroethylene antireflection overcoat reduces specular reflectance of opaque baffle coating by factor of nearly 2 at millimeter and infrared wavelengths. Easily applied by spraying Teflon(TM) Wet Lubricant (or equivalent) on opague coated surface. Though technique makes it difficult to control thickness of overcoat, experimental and theoretical studies indicate thickness has little effect because antireflective property based on creating graded-index absorber.
The increasing scale of cryogenic detector arrays for sub-millimeter and millimeter wavelength astrophysics has led to the need for large aperture, high index of refraction, low loss, cryogenic refracting optics. Silicon with n = 3.4, low loss, and relatively high thermal conductivity is a nearly optimal material for these purposes, but requires an antireflection (AR) coating with broad bandwidth, low loss, low reflectance, and a matched coffecient of thermal expansion. We present an AR coating for curved silicon optics comprised of subwavelength features cut into the lens surface with a custom three axis silicon dicing saw. These features constitute a metamaterial that behaves as a simple dielectric coating. We have fabricated and coated silicon lenses as large as 33.4 cm in diameter with coatings optimized for use between 125-165 GHz. Our design reduces average reflections to a few tenths of a percent for angles of incidence up to 30 deg. with low cross-polarization. We describe the design, tolerance, manufacture, and measurements of these coatings and present measurements of the optical properties of silicon at millimeter wavelengths at cryogenic and room temperatures. This coating and lens fabrication approach is applicable from centimeter to sub-millimeter wavelengths and can be used to fabricate coatings with greater than octave bandwidth.
Accumulation of soils and other particulate matter on the front cover glass of solar photovoltaic (PV) modules results in transmission losses that detrimentally affect the power output of PV installations. The conventional solution to this problem is manual abrasive scrubbing of modules, which entails significant water usage and manpower. To further combat this issue, there is a concerted effort within the PV industry to develop anti-soiling (AS) coatings to mitigate power losses due to soiling of PV modules, which can exceed 35% in some cases. However, relatively little is known about the fundamental physical and chemical mechanisms that enable anti-soiling behavior. In this project, a combination of advanced X-ray analysis tools and first principles computational modeling has employed to understand the physical and chemical interactions between environmental soils and PV cover glass materials. The specific objectives were: 1) investigate soiling interactions and cementation behavior of relevant PV materials, including bare glass, conventional antireflective (AR) coatings, and a commercial AS coating, using a library of representative particulate soils, and 2) utilize first principles computational spectroscopy modeling to interpret the experimental X-ray spectroscopy measurements and determine the detailed surface chemistry changes that occur on these surfaces in the presence of soiling and cementation.
Alteration of surface of silicon solar cell with chemical etchant prior to application of antireflection (AR) coating and encapsulant FEP Teflon, reduces surface reflectivity to 2%. Reduced reflection achieved occurs at all wavelengths resulting in improved short circuit current and spectral response. Improved collection efficiency is also expected.
Open-circuit voltages as high as 0.645 V (AM0, 25 C) have been obtained by a new process developed for low-resistivity silicon. The process utilizes high-dose phosphorus implantation followed by furnace annealing and simultaneous oxide growth. The effect of the thermally grown oxide is a reduction of surface recombination velocity; the oxide also acts as a moderately efficient antireflection (AR) coating. Boron-doped, float-zone silicon with resistivities from 0.1 to 1.0 (omega)(cm) has been processed according to this sequence; results show that the highest open-circuit voltage is obtained with 0.1(omega)(cm) starting material. The effects of Auger recombination and bandgap narrowing caused by high doping concentrations in the n(+)junction region have been investigated by implanting phosphorus over a wide range of dose levels. The effects of emitter-phosphorus concentrations tailored to optimize electric fields in the emitter have also been investigated.
High-efficiency dendritic cells were discussed. The influence of twin planes and heat treatment on the location and effect of trace impurities was of particular interest. Proper heat treatment often increases efficiency by causing impurities to pile up at twin planes. Oxide passivation had a beneficial effect on efficiency. A very efficient antireflective (AR) coating of zinc selenide and magnesium fluoride was designed and fabricated. An aluminum back-surface reflector was also effective.
Clamping device applies protective or antireflective dielectric coating to lenses or other optical elements. Alternative version of device applies thin sheet of dielectric film to ring or stretches it for clamping in holder to form pellicle or beam splitter. Defects avoided by new apparatus, which uniformly stretches dielectric films in radial direction and creates vacuum between them before thermally bonded to optical element.
Computer-controlled ink-jet-assisted metallization of the front surface of solar cells with metalorganic silver inks offers a maskless alternative method to conventional photolithography and screen printing. This method can provide low cost, fine resolution, reduced process complexity, avoidance of degradation of the p-n junction by firing at lower temperature, and uniform line film on rough surface of solar cells. The metallization process involves belt furnace firing and thermal spiking. With multilayer ink jet printing and firing, solar cells of about 5-6 percent efficiency without antireflection (AR) coating can be produced. With a titanium thin-film underlayer as an adhesion promoter, solar cells of average efficiency 8.08 percent without AR coating can be obtained. This efficiency value is approximately equal to that of thin-film solar cells of the same lot. Problems with regard to lower inorganic content of the inks and contact resistance are noted.