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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 217 records · Page 12
All sourcesNASA NTRSDOE OSTI
DOE OSTI2025

Image masks of global ship tracks for NASA MODIS data products

Ship tracks, long thin artificial cloud features formed from the pollutants in ship exhaust, are satellite-observable examples of aerosol-cloud interactions (ACI) that can lead to increased cloud albedo and thus increased solar reflectivity, phenomena of interest in solar radiation management. In addition to ship tracks being of interest to meteorologists and policy makers, their observed cloud perturbations provide benchmark evidence of ACI that remain poorly captured by climate models. To broadly analyze the effects of ship tracks, high-resolution satellite imagery data highlighting their presence are required. To support this, we provide a hand labelled dataset to serve as a benchmark for a variety of subsequent analyses. Established from a previous dataset that identified ship track presence using NASA’s MODIS Aqua satellite imager, our first-of-its-kind dataset is comprised of image masks: capturing full ship track regions, including their contours, emission points and dispersive patterns. In total, 300 images, or around 2,500 masked ship tracks, observed under varying conditions are provided, and may facilitate training of machine learning algorithms to automate extraction.

Atmospheric dynamics↗
DOE OSTI2015

Nanofabrication on unconventional substrates using transferred hard masks

Here, a major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based on re-usable silicon membrane hard masks, patterned using standard lithography and mature silicon processing technology. These masks, transferred precisely onto targeted regions, can be in the millimetre scale. They allow for fabrication on a wide range of substrates, including rough, soft, and non-conductive materials, enabling feature linewidths down to 10 nm. Plasma etching, lift-off, and ion implantation are realized without the need for scanning electron/ion beam processing, UV exposure, or wet etching on target substrates.

77 NANOSCIENCE AND NANOTECHNOLOGY↗
DOE OSTI2014

Fabrication of sub-12 nm thick silicon nanowires by processing scanning probe lithography masks

Silicon nanowires are key elements to fabricate very sensitive mechanical and electronic devices. We provide a method to fabricate sub-12 nm silicon nanowires in thickness by combining oxidation scanning probe lithography and anisotropic dry etching. Extremely thin oxide masks (0.3–1.1 nm) are transferred into nanowires of 2–12 nm in thickness. The width ratio between the mask and the silicon nanowire is close to one which implies that the nanowire width is controlled by the feature size of the nanolithography. This method enables the fabrication of very small single silicon nanowires with cross-sections below 100 nm{sup 2}. Those values are the smallest obtained with a top-down lithography method.

77 NANOSCIENCE AND NANOTECHNOLOGY↗
DOE OSTI2014

An orbital angular momentum radio communication system optimized by intensity controlled masks effectively: Theoretical design and experimental verification

A system of generating and receiving orbital angular momentum (OAM) radio beams, which are collectively formed by two circular array antennas (CAAs) and effectively optimized by two intensity controlled masks, is proposed and experimentally investigated. The scheme is effective in blocking of the unwanted OAM modes and enhancing the power of received radio signals, which results in the capacity gain of system and extended transmission distance of the OAM radio beams. The operation principle of the intensity controlled masks, which can be regarded as both collimator and filter, is feasible and simple to realize. Numerical simulations of intensity and phase distributions at each key cross-sectional plane of the radio beams demonstrate the collimated results. The experimental results match well with the theoretical analysis and the receive distance of the OAM radio beam at radio frequency (RF) 20 GHz is extended up to 200 times of the wavelength of the RF signals, the measured distance is 5 times of the original measured distance. The presented proof-of-concept experiment demonstrates the feasibility of the system.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗
DOE OSTI2021

Single-shot x-ray phase-contrast and dark-field imaging based on coded binary phase mask

We introduce a coded-mask-based multi-contrast imaging method for high-resolution phase-contrast and dark-field imaging. The method uses a binary phase mask designed to provide an ultra-high-contrast pattern and reference-free single-shot measurement and an algorithm based on maximum-likelihood optimization and automatic differentiation to perform simultaneous reconstruction of absorption, phase, and dark-field object images. Further, we demonstrate that the method has great potential for real-time quantitative phase imaging and wavefront sensing when combined with deep learning.

Qiao, Zhi (ORCID:0000000286285320)↗
DOE OSTI2025

Coded-mask-based wavefront sensing technique for APS nanofocusing beamline diagnostics

Here, we extend our recently developed coded-mask wavefront sensing technique to enable single-shot measurements of nanofocused x-ray beams. This method accurately reconstructs the focal beam profile by backpropagating the wavefront measured downstream of the beam focus. To validate its performance, we benchmarked it against the conventional fluorescence wire scan method, successfully measuring ∼120 nm focal spots at the 28-ID-B beamline of the Advanced Photon Source using a polymeric compound refractive lens. The results highlight the effectiveness of coded-mask wavefront sensing for high-precision beam profiling and its application as a real-time wavefront monitoring tool.

Shi, Xianbo [Argonne National Laboratory (ANL), Ar↗
DOE OSTI2021

Large aperture and durable glass-engraved optical metasurfaces using nanoparticle etching masks: prospects and future directions

Abstract Metasurfaces (MSs), or surfaces consisting of engineered spatially oriented sub-wavelength elements—also known as meta-atoms—are quickly becoming a burgeoning field of interest due to their seemingly unparalleled control over the propagation of light. This article will discuss the emergence of a MS technology that is based on dewetting thin metal films to form dry etching masks for MS fabrication. The novelty this process presents is the ability to spatially vary mask features—which translates into spatially varying index of the finished surface—in a way that, rather than writing subwavelength elements one-by-one, writes entire areas at once to provide a route to easily scale the process up to meter-sized optics. Glass-engraved MSs have shown to be laser damage resistant, with damage thresholds close to the parent substrate damage thresholds. Furthermore, these surfaces have proven to be mechanically durable and capable of handling normal loads two orders of magnitude higher than that of an average fingerprint pressure. This indicates that accidental handling contact is not detrimental to the MS optical performance. Also discussed are the foreseeable technological challenges, potential solutions for those obstacles, and some currently unexplored directions for future efforts.

47 OTHER INSTRUMENTATION↗
DOE OSTI2022

MAD: Self-Supervised Masked Anomaly Detection Task for Multivariate Time Series

In this paper, we introduce Masked Anomaly Detection (MAD), a general self-supervised learning task for multivariate time series anomaly detection. With the increasing availability of sensor data from industrial systems, being able to detecting anomalies from streams of multivariate time series data is of significant importance. Given the scarcity of anomalies in real-world applications, the majority of literature has been focusing on modeling normality. The learned normal representations can empower anomaly detection as the model has learned to capture certain key underlying data regularities. A typical formulation is to learn a predictive model, i.e., use a window of time series data to predict future data values. In this paper, we propose an alternative self-supervised learning task. By randomly masking a portion of the inputs and training a model to estimate them using the remaining ones, MAD is an improvement over the traditional left-to-right next step prediction (NSP) task. Our experimental results demonstrate that MAD can achieve better anomaly detection rates over traditional NSP approaches when using exactly the same neural network (NN) base models, and can be modified to run as fast as NSP models during test time on the same hardware, thus making it an ideal upgrade for many existing NSP-based NN anomaly detection models.

97 MATHEMATICS AND COMPUTING↗
DOE OSTI2018

Dopant Patterning by PECVD and Mechanical Masking for Passivated Tunneling Contact IBC Cell Architectures

We present a robust, simple technique for dopant patterning onto poly-Si/SiO 2 passivated tunneling contacts on nCz wafers. Heavily doped, thin nand ptype a-Si:H overlayers serve as solid-state dopant sources for blanket intrinsic a-Si:H layer on tunneling SiO 2 . Subsequent processing results in uniformly doped, functional n- and p-type passivated contacts. Furthermore, physical masking during the PECVD of the dopant source overlayers enables an interdigitated back contact (IBC) cell structure with sufficient doped finger edge fidelity to preserve an intrinsic electrode gap. Lithography-free, passivated contact IBC cell structures are made using a set of n-, p-, and metallization masks from patterned Si wafers with mechanical alignment. Alternatively, doped a-Si:H overlayers are patterned by dielectric layer deposition and lithography.

14 SOLAR ENERGY↗
DOE OSTI2022

Automating Genetic Algorithm Mutations for Molecules Using a Masked Language Model

Inspired by the evolution of biological systems, genetic algorithms have been applied to generate solutions for optimization problems in a variety of scientific and engineering disciplines. For a given problem, a suitable genome representation must be defined along with a mutation operator to generate subsequent generations. Unlike natural systems which display a variety of complex rearrangements (e.g. mobile genetic elements), mutation for genetic algorithms commonly utilizes only random point-wise changes. Furthermore, generalizing beyond point-wise mutations poses a key difficulty as useful genome rearrangements depend on the representation and problem domain. To move beyond the limitations of manually defined point-wise changes, here we propose the use of techniques from masked language models to automatically generate mutations. As a first step, common subsequences within a given population are used to generate a vocabulary. The vocabulary is then used to tokenize each genome. A masked language model is trained on the tokenized data in order to generate possible rearrangements (i.e. mutations). In order to illustrate the proposed strategy, we use string representations of molecules and use a genetic algorithm to optimize for drug-likeness and synthesizability. Finally, our results show that moving beyond random point-wise mutations accelerates genetic algorithm optimization.

59 BASIC BIOLOGICAL SCIENCES↗
DOE OSTI2017

Designing and Evaluating Redundancy-Based Soft-Error Masking on a Continuum of Energy versus Robustness

Near-threshold computing is an effective strategy to reduce the power dissipation of deeply-scaled CMOS logic circuits. However, near-threshold strategies exacerbate the impact of delay variations on device performance and increase the susceptibility to soft errors due to narrow voltage margins. The objective of this work is to develop and assess design approaches that leverage tradeoffs between performance and the resilience of fault masking coverage for various soft-error mitigation techniques. The primary insight from this work is identification of redundancy-based hardening techniques that can deliver increased benefits in terms of the fault coverage energy ratio (FCER) for the leveraged tradeoffs within iso-energy constraints at near-threshold voltage (NTV). Simulation results demonstrate that temporal redundancy approaches offer favorable tradeoffs in terms of FCER. They exhibit reduced impact on performance variations and achieve extensive soft fault masking, therefore improving the system robustness within acceptable delay constraints. Meanwhile, it is shown that a hybrid redundancy approach can be used to protect a low-power system to maintain throughput while tolerating soft errors. We demonstrate how the FCER metric can be used as an optimization parameter to guide circuit synthesis to meet performance and robustness goals. Lastly, the impact of design diversity on spatial and hybrid redundancy at NTV is assessed in terms of FCER and delay variation to form overall recommendations regarding soft-error mitigation at NTV.

97 MATHEMATICS AND COMPUTING↗
DOE OSTI2015

Suboxide/subnitride formation on Ta masks during magnetic material etching by reactive plasmas

Etching characteristics of tantalum (Ta) masks used in magnetoresistive random-access memory etching processes by carbon monoxide and ammonium (CO/NH{sub 3}) or methanol (CH{sub 3}OH) plasmas have been examined by mass-selected ion beam experiments with in-situ surface analyses. It has been suggested in earlier studies that etching of magnetic materials, i.e., Fe, Ni, Co, and their alloys, by such plasmas is mostly due to physical sputtering and etch selectivity of the process arises from etch resistance (i.e., low-sputtering yield) of the hard mask materials such as Ta. In this study, it is shown that, during Ta etching by energetic CO{sup +} or N{sup +} ions, suboxides or subnitrides are formed on the Ta surface, which reduces the apparent sputtering yield of Ta. It is also shown that the sputtering yield of Ta by energetic CO{sup +} or N{sup +} ions has a strong dependence on the angle of ion incidence, which suggests a correlation between the sputtering yield and the oxidation states of Ta in the suboxide or subnitride; the higher the oxidation state of Ta, the lower is the sputtering yield. These data account for the observed etch selectivity by CO/NH{sub 3} and CH{sub 3}OH plasmas.

36 MATERIALS SCIENCE↗
DOE OSTI2015

Phase measurements of EUV mask defects

Extreme Ultraviolet (EUV) Lithography mask defects were examined on the actinic mask imaging system, SHARP, at Lawrence Berkeley National Laboratory. Also, a quantitative phase retrieval algorithm based on the Weak Object Transfer Function was applied to the measured through-focus aerial images to examine the amplitude and phase of the defects. The accuracy of the algorithm was demonstrated by comparing the results of measurements using a phase contrast zone plate and a standard zone plate. Using partially coherent illumination to measure frequencies that would otherwise fall outside the numerical aperture (NA), it was shown that some defects are smaller than the conventional resolution of the microscope. We found that the programmed defects of various sizes were measured and shown to have both an amplitude and a phase component that the algorithm is able to recover.

42 ENGINEERING↗
DOE OSTI2016

On a two-layer Si{sub 3}N{sub 4}/SiO{sub 2} dielectric mask for low-resistance ohmic contacts to AlGaN/GaN HEMTs

The fabrication of a two-layer Si{sub 3}N{sub 4}/SiO{sub 2} dielectric mask and features of its application in the technology of non-fired epitaxially grown ohmic contacts for high-power HEMTs on AlGaN/GaN heterostructures are described. The proposed Si{sub 3}N{sub 4}/SiO{sub 2} mask allows the selective epitaxial growth of heavily doped ohmic contacts by nitride molecular-beam epitaxy and the fabrication of non-fired ohmic contacts with a resistance of 0.15–0.2 Ω mm and a smooth surface and edge morphology.

36 MATERIALS SCIENCE↗
DOE OSTI2022

Development of hard masks for reactive ion beam angled etching of diamond

Diamond offers good optical properties and hosts bright color centers with long spin coherence times. Recent advances in angled-etching of diamond, specifically with reactive ion beam angled etching (RIBAE), have led to successful demonstration of quantum photonic devices operating at visible wavelengths. However, larger devices operating at telecommunication wavelengths have been difficult to fabricate due to the increased mask erosion, arising from the increased size of devices requiring longer etch times. We evaluated different mask materials for RIBAE of diamond photonic crystal nanobeams and waveguides, and how their thickness, selectivity, aspect ratio and sidewall smoothness affected the resultant etch profiles and optical performance. We found that a thick hydrogen silesquioxane (HSQ) layer on a thin alumina adhesion layer provided the best etch profile and optical performance. The techniques explored in this work can also be adapted to other bulk materials that are not available heteroepitaxially or as thin films-on-insulator.

36 MATERIALS SCIENCE↗
DOE OSTI2020

Multi-line FLEET by imaging periodic masks

A simple linear configuration for multi-line FLEET velocimetry is used for the first time to image an overexpanded unsteady supersonic jet. The FLEET lines are spaced 0.5-1.0 mm apart and up to six lines can simultaneously be used to visualize the flowfield. These lines are created using periodic masks, despite the mask blocking 25 — 30% of the 10 mJ incident beam. Maps of mean single-component velocity in the direction along the principal flow axis, and turbulence intensity in that same direction, are created using multi-line FLEET, and computed velocities agree well with that obtained from single-line (traditional) FLEET. Compared to traditional FLEET, multi-line FLEET offers increased simultaneous spatial coverage and the ability to produce spatial correlations in the streamwise direction. This FLEET permutation is especially well-suited for short-duration test facilities

42 ENGINEERING↗
DOE OSTI2026

Custom surface reflectance, shade mask, and equivalent water thickness maps for the Colorado Headwaters Ecological Spectroscopy Study (2025)

This dataset contains land surface reflectance estimates and additional derived products generated from NEON Imaging Spectrometer (NIS) data collected in the Upper Gunnison river basin during June and July of 2025. Data was collected over three domains: the Upper East River (CRBU), Almont Triangle (ALMO), and the Upper Taylor Basin (UPTA). These products were derived from radiance and LiDAR data collected by the NEON Airborne Observation Platform (AOP) campaign funded by the Colorado Headwaters Ecological Spectroscopy Study (CHESS) (doi:10.15485/3017965). Products include per-pixel surface reflectance (rfl) and reflectance uncertainty (rfl_unc), observational data (obs), canopy equivalent water thickness (ewt), and shade masks. Atmospheric correction was performed per flightline using the ISOFIT (Imaging Spectrometer Optimal FITting) optimal estimation framework to estimate surface reflectance and the associated per-band reflectance uncertainty. Reflectance retrievals achieved a mean absolute error of 1.5% across diverse validation surfaces (see validation report.pdf). Equivalent water thickness was calculated from surface reflectance using the Beer–Lambert absorption of liquid water. Shade masks were generated based on the geometry between the sun angle, ground surface, and sensor at the time of flight. Data products are provided per-flightline and as mosaics for each domain. Flightline data products are provided as ENVI-formatted binary files (rfl, rfl_unc, ewt) and GeoTIFFs (shade). Reflectance and uncertainty mosaics are provided as tiled NetCDFs, while all other mosaicked products are provided as cloud-optimized GeoTIFFs. These formats are supported by common geospatial software (e.g., QGIS, ArcGIS, ENVI) and programmatic libraries in Python (e.g., rasterio, xarray, spectral, netCDF4) and R (e.g., terra, ncdf4). Processing workflows were designed to be equivalent to those used to generate the 2018 CHESS campaign airborne imaging spectroscopy data products (doi:10.15485/3013527). All outputs were co-registered to a common spatial grid to support time series analyses. CHESS Project Description: The Colorado Headwaters Ecological Spectroscopy Study (CHESS) comprised a multi-week airborne remote sensing and field observation campaign in the Upper Gunnison Basin, Colorado, conducted in June and July of 2025. Airborne remote sensing was conducted by the National Ecological Observatory Network Airborne Observation Platform (NEON AOP), concurrent with a field campaign run by the Rocky Mountain Biological Laboratory (RMBL), the Lawrence Berkeley National Laboratory (LBNL) and SLAC National Accelerator Laboratory Watershed Function Science Focus Area (SFA), and NASA-JPL (Jet Propulsion Laboratory) Earth Surface Mineral Dust Source Investigation (EMIT) program. Between June 10 and July 18, 2025, the NEON AOP flight team collected high-resolution aerial imaging spectroscopy and Light Detection and Ranging (LiDAR) data over three domains: the Upper East River (CRBU), Almont Triangle (ALMO), and the Upper Taylor Basin (UPTA). In coordination with the flights, a field campaign acquired ground-truth observations, including observations of vegetation composition, foliar traits, forest demography, and subsurface properties in 18 core sampling areas within the domains. Additional surface water observations were taken at over 380 point locations. All CHESS campaign datasets can be found within the CHESS ESS-DIVE data portal: https://data.ess-dive.lbl.gov/portals/chess. Funding Acknowledgment: Data acquisition was performed under a grant from the National Aeronautics and Space Administration (80NSSC24K1005). Computational research was carried out at the Jet Propulsion Laboratory, California Institute of Technology, under a contract with the National Aeronautics and Space Administration (80NM0018D0004) and was funded by EMIT Extended Mission Phase E Science.

2018 NEON and 2025 CHESS Campaigns↗
DOE OSTI2020

Micropulse Lidar Cloud Mask (MPLCMASK) Value-Added Product for the Fast-Switching Polarized Micropulse Lidar Technical Report

Lidar backscattered signal is a useful tool for identifying vertical cloud structure in the atmosphere in optically thin clouds. Cloud boundaries derived from lidar signals are a necessary input for popular ARM data products, such as the Active Remote Sensing of Clouds (ARSCL) product. An operational cloud boundary algorithm (Wang and Sassen 2001) has been implemented for use with the ARM Micropulse Lidar (MPL) systems. In addition to retrieving cloud boundaries above 500 m, the value-added product (VAP) named Micropulse Lidar Cloud Mask (MPLCMASK) applies lidar-specific corrections (i.e., range-square, background, deadtime, and overlap) as described in Campbell et al. (2002) to the measured backscattered lidar. Depolarization ratio is computed using the methodology developed by Flynn et al. (2007) for polarization-capable MPL systems. The cloud boundaries output from MPLCMASK will be the primary lidar cloud mask for input to the ARSCL product and will be applied to all MPL systems, including historical data sets.

54 ENVIRONMENTAL SCIENCES↗