NO 2 Interactions with MoO 3 and CuO at Atmospherically Relevant Pressures
NO x concentrations in some geographic regions are harmful to human health. Gas filters to trap NO x and other toxic chemicals contain metal oxides, including MoO 3 and CuO. These materials are also being investigated for NO x gas sensors. In a step to understand the fundamental adsorption mechanism in sensors and the effect on binding site availability in gas filters, ambient-pressure X-ray photoelectron spectroscopy (APXPS) was used to study the interaction of NO 2 with polycrystalline MoO 3 and CuO surfaces under pressures up to 0.01 Torr (14 parts per million volume (ppmv)). Density functional theory-based computational modeling was performed to reveal the mechanisms of NO 2 interactions with the MoO 3 (010) and CuO(111) surfaces to aid interpretation of the experimental results. With pressure dependence, NO 2 interacts with reduced Mo 5+ atoms generated by oxygen vacancies and abstracts hydrogen atoms from hydroxyl groups on MoO 3 without accumulating N-containing species on the surface; vacancy-induced electronic states in the band gap are also removed, hinting toward an increase in the resistivity of the material. N-containing species begin accumulating on the CuO surface at atmospherically relevant pressures of 140 ppbv. NO 2 only decomposes at oxygen vacancy sites of CuO. The nitrogen species leave the CuO surface upon evacuation, highlighting the importance of in situ surface characterization when studying gas sensing and adsorption mechanisms. Finally, these results imply that NO 2 removes hydroxyl and O vac binding sties on these materials when used in gas filtration and sensing applications. Furthermore, the results show the key role of O vac sites in the gas sensing mechanism of MoO 3 and highlight the potential of APXPS for further studies of gas sensors.