Stable Photoemission from the Wehnelt Aperture Surface in 4D Ultrafast Electron Microscopy
Here we show that photoemission with high long-term stability that is immediate and robust can be generated from the surface of the Wehnelt aperture in a TEG-based UEM. Further, we show that the resulting photobeam quality can be at least as good as that from LaB 6 , whether under photo or thermionic operation. We hypothesize that the energy distribution and the temporal properties of the beam are improved relative to LaB 6 owing to the closer match of photon energy to aperture work function.