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At least 199 records · Page 11
All sourcesNASA NTRSDOE OSTI
NASA NTRS1985

Grazing incidence metal optics for the Berkeley Extreme Ultraviolet Explorer satellite - A progress report

The four flight Wolter-Schwarzschild mirrors currently under fabrication for the Extreme Ultraviolet Explorer (EUVE) satellite are described. The principal figuring operation of these grazing incidence metal mirrors (gold over nickel on an aluminum substrate) is carried out by diamond turning at the Lawrence Livermore National Laboratories. Turning has been accomplished and optical testing results analyzed for three of the mirrors. As-turned values of 1.7 arc sec full width at half maximum (FWHM) and half energy width (HEW) of 5 arc seconds in the visible have been achieved. These results illustrate the great potential of precision fabrication technology for the production of large grazing incidence optics.

Finley, D.↗
NASA NTRS1987

Surface evaluation of the grazing incidence mirrors for the Extreme Ultraviolet Explorer

The EUV scattering from the Wolter-Schwarzschild type I short wavelength scanner mirror aboard the Extreme Ultraviolet Explorer is measured, and the results are used to evaluate the surface microroughness of the mirror. It is found that the most likely values for the mirror surface are sigma = 20 A, and rho = 40 microns. These results are consistent with previous estimates, but with a higher degree of certainty. The full-scale simulation presented here allows over 99 percent of the light distribution to be reasonably modeled.

Green, James↗
NASA NTRS1990

Contamination control program results from three years of ground operations on the Extreme Ultraviolet Explorer instruments

A stringent contamination-control plan has been developed for the optical components of the Extreme Ultraviolet Explorer instruments, whose performance in the 80-900 A wavelength range is highly sensitive to particulate and molecular contamination. The contamination-control program has been implemented over the last three years during assembly, test and calibration phases of the instrument. These phases have now been completed and the optics cavities of the instruments have been sealed until deployment in space. Various approaches are discussed which have been used during ground operations to meet optics' contamination goals within the project schedule and budget. The measured optical properties of EUV witness mirrors are also presented which remained with the flight mirrors during ground operations. These were used to track optical degradation due to contamination from the cleanroom and high-vacuum test-chamber environments.

Ray, David C.↗
NASA NTRS1993

Extreme Ultraviolet Explorer attitude determination support with a multimission three-axis stabilized spacecraft flight dynamics support system

The Extreme Ultraviolet Explorer (EUVE) was launched June 7, 1992 by an expendable Delta 2 launch vehicle. The Flight Dynamics Facility (FDF) at NASA Goddard Space Flight Center used a multimission three-axis stabilized spacecraft (MTASS) Flight Dynamics Support System (FDSS) to support the EUVE launch and mission operations. For EUVE, MTASS has been used to monitor attitude sensor performance, study OBC attitude determination performance, and study attitude perturbations. The current status of these efforts are summarized. After its successful implementation for EUVE, the Upper Atmosphere Research Satellite (UARS), and the Solar Anomalous and Magnetospheric Particle Explorer (SAMPEX), MTASS has demonstrated multimission flight dynamics support systems can effectively bridge the gap between single-mission support systems of the past and future generic systems.

Harman, Richard↗
NASA NTRS1988

Two normal incidence collimators designed for the calibration of the extreme ultraviolet explorer

Two Dall-Kirkham, normal incidence collimators have been designed to calibrate the imaging properties of the Extreme Ultraviolet Explorer over the wavelength region from 114 to 2000 A. The mirrors of the short-wavelength, 25-cm diameter collimator are superpolished Zerodur which have been multilayer coated for optimal reflectivity at 114 A. The mirrors of the long-wavelength, 41.25-cm diameter collimator are gold coated Zerodur for high reflectance above 300 A. The design, performance, and future use of these collimators in the extreme ultra-violet is discussed.

Jelinsky, Sharon R.↗
NASA NTRS1974

Extreme ultraviolet spectra of highly ionized oxygen and fluorine

The foil-excitation method has been used to study the extreme ultraviolet spectra of highly ionized oxygen and fluorine. Several previously unreported lines in heliumlike fluorine are reported and other newly reported lines in heliumlike oxygen have been measured to higher accuracy. Included in the measurements are certain heliumlike oxygen transitions of significance in interpretation of solar-flare spectral observations. The wavelength determinations are usually in good agreement with calculated results which includes relativistic corrections, but discrepancies arise when nonrelativistic calculations are used. A comparison of the present results and those recently obtained by theta-pinch and laser-induced plasma sources is made for both heliumlike and lithiumlike ions; a few discrepancies occur, with results in most cases in better agreement with relativistically corrected calculations. Certain unidentified lines in the spectra may be attributable to radiative transitions between quartet states of lithiumlike ions.

Pegg, D. J.↗
NASA NTRS1977

Optical design of a stigmatic spectroheliometer for photometric studies of dynamic phenomena at extreme-ultraviolet wavelengths

The design of a stigmatic spectroheliometer for photometric studies of dynamic phenomena in the solar atmosphere at extreme ultraviolet (EUV) wavelengths is described. The normal-incidence spectrometer requires only one reflective surface, and is equipped with a series of exit slits and associated one-dimensional detector arrays that are mounted at the secondary (vertical) foci of the concave diffraction grating. It is shown that such a spectrometer mounted at the focus of an off-axis paraboloid telescope mirror of the size employed in the EUV spectroheliometer flown on Skylab could record monochromatic images of a 2 x 2 (arcmin) sq field-of-view with a spatial resolution element of 1 x 1 (arcsec) sq in a time of 4 s, 24 s, or 4 min, depending on whether the region studied is flaring, active, or quiet. The resulting spectroheliograms would have an average photometric precision of 10% and a spectral purity of 0.1 A.

Huber, M. C. E.↗
NASA NTRS1984

Attitude Control System for the Extreme Ultraviolet Explorer Satellite

The requirements, design, and expected performance of the Attitude Control Subsystem for the spin-stabilized Extreme Ultraviolet Explorer Satellite are presented. In the sky-mapping phase, closed-loop magnetic control keeps the spin axis pointed toward the sun. In the spectroscopy phase, the attitude control loop is closed via the ground. The satellite's attitude and spin rate are determined using periodically downlinked star data. An attitude control algorithm generates commands to be uplinked to the satellite for spin axis precession and spin rate control. Computer simulations of the satellite dynamic response, pointing error, and stability during spin axis precession are presented, and parameters that affect the pointing performance are evaluated.

Wong, E. C.↗
NASA NTRS1992

Extreme ultraviolet spectroscopy of Capella

The X-ray active binary system Capella was observed with a moderate-resolution extreme ultraviolet spectrograph from 200 to 330 A. Two low-level emission features were detected. One most likely is geocoronal He II 304 A emission, while the other probably originates from the corona of Capella. The weak stellar emission at 304 A is in direct conflict with predictions of the intrinsic stellar He II flux based on standard scaling arguments but is consistent with the only previous observation of Capella in the EUV. The most plausible explanation for the lack of stellar 304 A emission is a warm wind from the active G0 III star.

Green, James C.↗
NASA NTRS1993

Extreme Ultraviolet Explorer Science Operation Center

The EUVE Science Operations Center (ESOC) is a satellite payload operations center for the Extreme Ultraviolet Explorer project, located on the Berkeley campus of the University of California. The ESOC has the primary responsibility for commanding the EUVE telescopes and monitoring their telemetry. The ESOC is one of a very few university-based satellite operations facilities operating with NASA. This article describes the history, operation, and advantages of the ESOC as an on-campus operations center.

Wong, G. S.↗
NASA NTRS1993

The attitude accuracy consequences of on-orbit calibration of the Extreme Ultraviolet Explorer attitude sensors by the Flight Dynamics Facility at Goddard Space Flight Center

The science mission of the Extreme Ultraviolet Explorer (EUVE) requires attitude solutions with uncertainties of 27, 16.7, 16.7 arcseconds (3 sigma) around the roll, pitch, and yaw axes, respectively. The primary input to the attitude determination process is provided by two NASA standard fixed-head star trackers (FHSTs) and a Teledyne dry rotor inertial reference unit (DRIRU) 2. The attitude determination requirements approach the limits attainable with the FHSTs and DRIRU. The Flight Dynamics Facility (FDF) at Goddard Space Flight Center (GSFC) designed and executed calibration procedures that far exceeded the extent and the data volume of any other FDF-supported mission. The techniques and results of this attempt to obtain attitude accuracies at the limit of sensor capability and the results of analysis of the factors that limit the attitude accuracy are the primary subjects of this paper. The success of the calibration effort is judged by the resulting measurement residuals and comparisons between ground- and onboard-determined attitudes. The FHST star position residuals have been reduced to less tha 4 arcsec per axis -- a value that appears to be limited by the sensor capabilities. The FDF ground system uses a batch least-squares estimator to determine attitude. The EUVE onboard computer (OBC) uses an extended Kalman filter. Currently, there are systematic differences between the two attitude solutions that occasionally exceed the mission requirements for 3 sigma attitude uncertainty. Attempts to understand and reduce these differences are continuing.

Hashmall, J.↗
DOE OSTI2024

Towards Full Field-of-View Fourier Ptychography for Extreme Ultraviolet Microscope

We evaluate various Fourier ptychographic microscopy (FPM) reconstruction algorithms using both simulated and experimental data acquired from an Extreme Ultraviolet (EUV, 13.5 nm wavelength) microscope. We specifically focus on the algorithms' ability to robustly address field-dependent aberrations, which enables increased spatial resolution and quantitative phase imaging across an expanded field of view. We systematically compare the algorithms' performance under aberrations for a single zoneplate imaging system, utilizing Fourier Ring Correlation (FRC) as a systematic metric for assessing reconstruction quality. Furthermore, we explore the impact of systematic errors on the reconstruction of experimental data, aiming to increase the effective field of view by 25-fold, from the nominal 5x5 um2 diffraction-limited area. Additionally, our evaluation incorporates innovative FPM-adjacent methodologies, including the Angular Ptychographic Imaging with Closed-form method (APIC), for reconstructing EUV images.

Gu, Chaoying↗
DOE OSTI2022

Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning

Background: Metal-containing resists entered the mainstream semiconductor industry process flow to mitigate the low absorbance of extreme ultraviolet (EUV) radiation by thin films of organic resists that lead to poor sensitivity and their inability to handle rigors of development and etching conditions. Aim: The long and rich history of using metal-containing resists in electron beam lithography can offer interesting lessons, pointers, and insights to the relatively newcomer EUV lithography, which is slightly over a decade old. Approach: Electron beam lithography has been enjoying a considerable amount of freedom in the choice of resist materials for close to 50 years; especially the use of metal-containing resists to attain not only single digit nanometer resolution, higher sensitivity, and etch resistance but also lower line-edge roughness. Here, we make a comprehensive historical review of the progress made in the patterning of metal-containing resists in electron beam lithography and derive insights that can be potentially useful in EUV patterning. Perspectives: Small molecular weight resists are proven to be crucial for achieving higher resolution with low line-edge roughness. Simplifying process flow by reducing etch-stack-layers is conceivable with metal-containing resists, along with direct-patterning of functional materials for heterogeneous integration. Efficient contact hole patterning at tighter pitches may be incumbent on progress in positive-tone resist research.

77 NANOSCIENCE AND NANOTECHNOLOGY↗
NASA NTRS1987

Telescience - Concepts and contributions to the Extreme Ultraviolet Explorer mission

It is shown how the contradictory goals of low-cost and fast data turnaround characterizing the Extreme Ultraviolet Explorer (EUVE) mission can be achieved via the early use of telescience style transparent tools and simulations. The use of transparent tools reduces the parallel development of capability while ensuring that valuable prelaunch experience is not lost in the operations phase. Efforts made to upgrade the 'EUVE electronics' simulator are described.

Marchant, Will↗
NASA NTRS1993

Observations of PKS 2155-304 with the Extreme Ultraviolet Explorer

We present a high-accuracy light curve for the BL Lac object PKS 2155-304, observed with the Extreme Ultraviolet Explorer. The light curve shows variations of about 10 percent over a 1.3 d observing period. The observed EUV flux is a factor of 1.7 fainter than when PKS 2155-304 was observed by the ROSAT Wide Field Camera (WFC) during the EUV survey. The optical flux during our observations is about a factor of 2 fainter than during the WFC observations, so we conclude that the overall spectral shape is invariant as the flux varies. These observations support the model in which the spectrum from the optical to the X-ray band is given by a synchrotron spectrum. Extrapolating an X-ray power-law spectrum with an energy index of 1.66 into the EUV only slightly overpredicts the observed EUV count rates so that changing any one of several spectral parameters within the uncertainties gives an acceptable model.

Marshall, H. L.↗
DOE OSTI2025

Time-Domain Extreme-Ultraviolet Diffuse Scattering Spectroscopy of Nanoscale Surface Phonons

Here, we report the observation of dynamic fringe patterns in the diffuse scattering of extreme ultraviolet light from surfaces, following femtosecond optical excitation. At each point on the detector, the diffuse scattering intensity exhibits oscillations at well-defined frequencies that correspond to surface phonons with wave vectors determined by the scattering geometry, indicating that the optical excitation generates coherent surface phonons propagating in all directions and spanning a wavelength range from 60 to 300 nm. This phenomenon is observed on a variety of samples, including single-layer and multilayer metal films, as well as bulk semiconductors. The measured surface phonon dispersions show good agreement with theoretical calculations. By comparing signal amplitudes from samples with different surface morphologies, we find that the excitation mechanism is linked to the natural surface roughness of the samples. However, the signal is still detectable on extremely smooth surfaces with subnanometer roughness. Our findings demonstrate a simple and effective method for optically exciting coherent surface phonons with nanoscale wavelengths on a wide range of solid samples and establish a foundation for surface phonon spectroscopy in a wave vector range well beyond the limit of conventional surface Brillouin scattering.

Capotondi, F. [Elettra-Sincrotrone Trieste (Italy)↗
NASA NTRS1982

Optical constants in the extreme ultraviolet and soft X-ray region

The nature of optical constants and their measurement by reflection or absorption techniques in the extreme ultraviolet and soft X-ray spectral region from 30 to 3000 eV is discussed with emphasis on mirror design. Sources of optical constant data are mentioned and reflectance measurements for SiC and Kanigen between 40 and 200 eV are reported.

Rife, J. C.↗