High Pressure Behavior of 7:4 Mullite and Boron-Substituted Mullite: Compressibility and Mechanisms of Amorphization
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This work reports the atomic layer deposition (ALD) of tin oxide-phosphate films using tetrakis(dimethylamino)tin and trimethyl phosphate as precursors. The growth rates were 1.23–1.84 Å/cycle depending upon the deposition temperature and precursor combination. The ionic conductivity of the ALD tin oxide-phosphate films was evaluated by cross-plane impedance measurements in the temperature range of 50–300 °C under atmospheric air, with the highest conductivity measured as 1.92 × 10{sup −5} S cm{sup −1} at 300 °C. Furthermore, high-resolution x-ray photoelectron spectroscopy exhibited two O1s peaks that were classified as two subpeaks of hydroxyl ions and oxygen ions, revealing that the quantity of hydroxyl ions in the ALD tin oxide-phosphate films influences their ionic conductivity.
To form antireflection (AR) coatings to hide metal architecture in display technologies, we deposited thin films of metal Mo and oxide MoOx by sputtering targets of various compositions using pure Ar sputter gas. The optical constants [n,k] of these samples were measured by the direct numerical solution of reflectance and transmittance at each wavelength point measured. We find that 50 nm films are uniform in the growth direction, but for thicker 100 nm samples, evidence exists for nonuniform growth, where the top 20 nm appears to be metal rich. From these [n,k], negative Tauc bandgap energies show these oxides are semi-metals. We then identified the specific composition (x) that optimizes the AR response for a host of metals (Al, Cu, Ag, Au). Finally, two methods were used to understand why these MoOx materials function well as AR media, including (i) using phasor rays and (ii) developing a universal expression for the AR condition that applies to both dielectric and metal substrates. In (i), we find two characteristics for AR of metals: (a) its optical thickness should be roughly π3, not the π2 for dielectrics, since for MoOx, their [r^ij,t^ij] Fresnel phases differ from the usual [180°, 0°] of dielectrics; and (b) the medium incorporates a k-dominant strategy whose function is to absorb the energy that is reflected at the AR/metal interface. In (ii), the universal AR condition is found to be r^01+r^12z^=0. For dielectrics, this reduces to the well-known nAR=nairnsub condition. However, for metals, a concise analytic expression is lacking since this expression is highly nonlinear but is easily solved by numerical methods.
Purpose: CMOS-based aSe detectors compared to CsI-TFT-based flat panels have the advantages of higher spatial sampling due to smaller pixel size and decreased blurring characteristic of direct rather than indirect detection. For systems with such detectors, the limiting factor degrading image resolution then becomes the focal-spot geometric unsharpness. This effect can seriously limit the use of such detectors in areas such as cone beam computed tomography, clinical fluoroscopy and angiography. In this work a technique to remove the effect of focal-spot blur is presented for a simulated aSe detector. Method: To simulate images from an aSe detector affected with focal-spot blur, first a set of high-resolution images of a stent (FRED from Microvention, Inc.) were acquired using a 75µm pixel size Dexela-Perkin-Elmer detector and averaged to reduce quantum noise. Then the averaged image was blurred with a known Gaussian blur at two different magnifications to simulate an idealized focal spot. The blurred images were then deconvolved with a set of different Gaussian blurs to remove the effect of focal-spot blurring using a threshold-based, inverse-filtering method. Results: The blur was removed by deconvolving the images using a set of Gaussian functions for both magnifications. Selecting the correct function resulted in an image close to the original; however, selection of too wide a function would cause severe artifacts. Conclusion: Experimentally, focal-spot blur at different magnifications can be measured using a pin hole with a high resolution detector. This spread function can be used to deblur the input images that are acquired at corresponding magnifications to correct for the focal spot blur. For CBCT applications, the magnification of specific objects can be obtained using initial reconstructions then corrected for focal-spot blurring to improve resolution. Similarly, if object magnification can be determined such correction may be applied in fluoroscopy and angiography.
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It is demonstrated that the surface-relief orientation in the form of one-dimensional gratings with a period of 1.20 ± 0.02 μm formed under processing of hydrogenated-silicon films by femtosecond laser pulses (1.25 μm) with an energy density of 0.15 J/cm{sup 2} is determined by the direction of the polarization vector of the radiation and total laser exposure. Based on the results of the analysis of Raman spectra, the presence of a nanocrystalline phase of silicon with a volume fraction between 15 and 67% (depending on processing conditions) is detected. The observed processes of micro- and nanostructuring are caused by excitation of the surface plasmon–polaritons and nanocrystallization in the near-surface region in the field of high-power femtosecond laser pulses, respectively. In addition, formation of polymorph modifications of silicon Si-III and Si-XII under femtosecond laser processing with a number of pulses exceeding 500 is discovered. Anisotropy of the Raman signal for the above polymorph modifications is revealed.
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This work focused on synthesizing a wide range of oxides containing two or more metals, and measuring their properties. Many simple metal oxides such as zirconium oxide, have been extensively studied in the past. We developed a technique in which we create a large number of compositions simultaneously and examine their behavior to understand trends and identify high performance materials. Superior performance generally comes in the form of increased responsiveness; in the materials we have studied this may mean more electrical charge for a given voltage in a capacitor, faster switching for a given drive in a transistor, more current for a given voltage in an ionic conductor, or more current for a given illumination in a solar cell. Some of the materials we have identified may find use in decreasing the power needed to operate integrated circuits, other materials could be useful for solar power or other forms of energy conversion.
In the subsurface, MgO engineered barriers are employed at the Waste Isolation Pilot Plant (WIPP), a transuranic waste repository near Carlsbad, NM. During service, the MgO will be exposed to high concentration brine environments and may form stable intermediate phases that can alter the barriers effectiveness. Here, MgO was aged in water and three different brine solutions. X-ray diffraction (XRD) and 1 H nuclear magnetic resonance (NMR) analysis were performed to identify the formation of secondary phases. After aging, ~4% of the MgO was hydrated and fine-grained powders resulted in greater loss of crystallinity than hard granular grains. 1 H magic angle spinning (MAS) NMR spectra resolved minor phases not visible in XRD, indicating that diverse 1 H environments are present along with Mg(OH) 2 . Density functional theory (DFT) simulations for several proposed Mg-O-H, Mg-CI-O-H, and Na-O-H containing phases were performed to index peaks in the experimental 1 H MAS NMR spectra. While proposed intermediate crystal structures exhibited overlapping 1 H NMR peaks, Mg-O-H intermediates were attributed to the growth of the 1.0-0.0ppm peak while the Mg-CI-O-H structures contributed to the 2.5- 5.0ppm peak in the chloride containing brines. Overall, NMR analysis of aged MgO indicates the formation of a range of possible intermediate structures that cannot be resolved with XRD analysis alone.
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