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DOE OSTI · 3377737

Combinatorial deposition of Au–Bi alloys via high-rate magnetron sputtering

Goodelman, Daniel C. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)] (ORCID:0009000505959813)·Engwall-Holmes, Alison M. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)] (ORCID:0000000156089217)·Taylor, Gregory V. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)]·Kim, Eunjeong [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)]·Pendse, A. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)]·Shin, Swanee J. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)] (ORCID:0000000183301260)·Kucheyev, Sergei O. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)]·Aji, Leonardus Bimo Bayu [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)]
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Abstract

Gold–bismuth (Au–Bi) alloy films are promising candidate materials for inertial confinement fusion (ICF) hohlraums due to their high laser-to-x-ray conversion efficiency, particularly compared with Au, Ta–Au, and Bi hohlraums. However, the fabrication of uniform and dense Au–Bi alloy films remains a challenge. Here, we use a combination of Monte-Carlo modeling and experiments to demonstrate that the microstructure and properties of Au–Bi alloy films can be greatly improved when direct-current magnetron sputtering with high deposition rates of ⩾5 μm h -1 is used. Resultant films are ~90% of their maximum theoretical densities and have low O content of <1 at.%. Films with Bi content above 40 at. % exhibit high electrical resistivity >100μΩ cm, making them suitable for both magnetized and non-magnetized ICF schemes.

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Goodelman, Daniel C. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)] (ORCID:0009000505959813), Engwall-Holmes, Alison M. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)] (ORCID:0000000156089217), Taylor, Gregory V. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)], Kim, Eunjeong [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)], Pendse, A. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)], Shin, Swanee J. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)] (ORCID:0000000183301260), Kucheyev, Sergei O. [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)], Aji, Leonardus Bimo Bayu [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)]. 2026-07-07. Combinatorial deposition of Au–Bi alloys via high-rate magnetron sputtering. https://doi.org/10.1088/1361-6463/ae8308

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