DOE OSTI · 2566971
Amorphous boron nitride: synthesis, properties and device application
Abstract
Amorphous boron nitride (a-BN) exhibits remarkable electrical, optical, and chemical properties, alongside robust mechanical stability, making it a compelling material for advanced applications in nanoelectronics and photonics. This review comprehensively examines the unique characteristics of a-BN, emphasizing its electrical and optical attributes, state-of-the-art synthesis techniques, and device applications. Key advancements in low-temperature growth methods for a-BN are highlighted, offering insights into their potential for integration into scalable, CMOS-compatible platforms. Additionally, the review discusses the emerging role of a-BN as a dielectric material in electronic and photonic devices, serving as substrates, encapsulation layers, and gate insulators. Finally, perspectives on future challenges, including defect control, interface engineering, and scalability, are presented, providing a roadmap for realizing the full potential of a-BN in next-generation device technologies.
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Sattari-Esfahlan, Seyed Mehdi [Institute for Microelectronics, Vienna (Austria)], Mirzaei, Saeed [Brno University of Technology (Czech Republic); Fraunhofer Institute for Material and Beam Technology, Dresden (Germany)], Josline, Mukkath Joseph [Ajou University, Suwon (Korea, Republic of)], Moon, Ji-Yun [Washington Univ., St. Louis, MO (United States)], Hyun, Sang-Hwa [Sungkyunkwan Univ., Suwon (Republic of Korea)], Jang, Houk [Brookhaven National Laboratory (BNL), Upton, NY (United States). Center for Functional Nanomaterials (CFN)] (ORCID:0000000272361134), Lee, Jae-Hyun [Sungkyunkwan Univ., Suwon (Republic of Korea); National Univ. of Singapore (Singapore)] (ORCID:0000000151178923). 2025-05-02. Amorphous boron nitride: synthesis, properties and device application. https://doi.org/10.1186/s40580-025-00486-1
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