DOE OSTI · 1545487
Solid-state framing camera operating in interferometric mode
Abstract
A high speed solid-state framing camera has been created which can operate in interferometric mode. This camera measures the change in the index of refraction of a semiconductor when x-rays are incident upon it. This instrument uses an x-ray transmission grating/mask in front of the semiconductor to induce a corresponding phase grating in the semiconductor which can then be measured by an infrared probe beam. The probe beam scatters off of this grating, enabling a measure of the x-ray signal incident on the semiconductor. In this specific instrument, the zero-order reflected probe beam is attenuated and interfered with the diffracted orders to produce an interferometric image on a charge coupled device camera of the phase change induced inside the semiconductor by the incident x-rays.
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Baker, K. L., Steele, P. T., Stewart, R. E., Vernon, S. P., Hsing, W. W., Remington, B. A.. 2018-08-31. Solid-state framing camera operating in interferometric mode. https://doi.org/10.1063/1.5038108
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