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DOE OSTI · 1406567

Electroless atomic layer deposition

Robinson, David Bruce·Cappillino, Patrick J.·Sheridan, Leah B.·Stickney, John L.·Benson, David M.
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Abstract

A method of electroless atomic layer deposition is described. The method electrolessly generates a layer of sacrificial material on a surface of a first material. The method adds doses of a solution of a second material to the substrate. The method performs a galvanic exchange reaction to oxidize away the layer of the sacrificial material and deposit a layer of the second material on the surface of the first material. The method can be repeated for a plurality of iterations in order to deposit a desired thickness of the second material on the surface of the first material.

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36 MATERIALS SCIENCE

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Robinson, David Bruce, Cappillino, Patrick J., Sheridan, Leah B., Stickney, John L., Benson, David M.. 2017-10-31. Electroless atomic layer deposition. https://www.osti.gov/biblio/1406567

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