NASA NTRS · 20080004949
Lithography system using quantum entangled photons
Abstract
A system of etching using quantum entangled particles to get shorter interference fringes. An interferometer is used to obtain an interference fringe. N entangled photons are input to the interferometer. This reduces the distance between interference fringes by n, where again n is the number of entangled photons.
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Williams, Colin, Dowling, Jonathan, della Rossa, Giovanni. 2002-11-12. Lithography system using quantum entangled photons. https://ntrs.nasa.gov/citations/20080004949
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