Optical Potential Field Mapping System

Abstract

The present invention relates to an optical system for creating a potential field map of a bounded two dimensional region containing a goal location and an arbitrary number of obstacles. The potential field mapping system has an imaging device and a processor. Two image writing modes are used by the imaging device, electron deposition and electron depletion. Patterns written in electron deposition mode appear black and expand. Patterns written in electron depletion mode are sharp and appear white. The generated image represents a robot's workspace. The imaging device under processor control then writes a goal location in the work-space using the electron deposition mode. The black image of the goal expands in the workspace. The processor stores the generated images, and uses them to generate a feedback pattern. The feedback pattern is written in the workspace by the imaging device in the electron deposition mode to enhance the expansion of the original goal pattern. After the feedback pattern is written, an obstacle pattern is written by the imaging device in the electron depletion mode to represent the obstacles in the robot's workspace. The processor compares a stored image to a previously stored image to determine a change therebetween. When no change occurs, the processor averages the stored images to produce the potential field map.