Design of A CVD Reactor for the Deposition of Diamond in A Microgravity Environment

M L Languell; J L Davidson; A M Strauss

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NASA NTRS · 19940005672

Design of A CVD Reactor for the Deposition of Diamond in A Microgravity Environment

M L Languell·J L Davidson·A M Strauss

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Abstract

There is a growing body of theoretical and experimental evidence suggesting that the uniformity, rate, adhesion, quality, and other key properties of Chemical Vapor Deposition (CVD) diamond coatings are influenced by the gas mixing kinetics in the thermal plasma environment of the reaction chamber. The implementation of, for example, Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD) process in microgravity has, thus, been suggested. Such a diamond deposition system, which overcomes the limitations of present systems and which is distiguishable from them by the use of high pressure MPECVD and recirculation of the would be effluent hydrogen and carbon, is described. Given the key fact that there is nothing in the effluent of the MPECVD process that is truly a byproduct or 'waste', the system can, at least in principle, lend itself to being closed loop yet dynamic. The exhaust contains hydrogen and carbon species which can be recirculated to the plasma reactor, that is, since there are no unusable reaction byproducts, the effluent can be fed back to the reaction chamber with no detriment, thus allowing deployment in a microgravity environment.

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M L Languell, J L Davidson, A M Strauss. 1992-08-01. Design of A CVD Reactor for the Deposition of Diamond in A Microgravity Environment. https://ntrs.nasa.gov/citations/19940005672

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