NASA NTRS · 19860000431
Tandem-Mirror Ion Source
Abstract
Improved ion source produces beam of ions at any kinetic energy from 1 to 1,000 eV, with little spread in energy or angle. Such ion beams useful in studies of surface properties of materials, surface etching, deposition, and development of plasma-diagnostic instrumentation. Tandemmirror ion source uses electrostatic and magnetic fields to keep electrons in ionization chamber and assure uniform output ion beam having low divergence in energy and angle.
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Biddle, A., Stone, N., Reasoner, D., Chisholm, W., Reynolds, J.. 1986-09-01. Tandem-Mirror Ion Source. https://ntrs.nasa.gov/citations/19860000431
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