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NASA NTRS · 19850042517

High-voltage solar-cell chip

Abstract

Integrated circuit technology has been successfully applied to the design and fabrication of 0.5 x 0.5-cm planar multijunction solar-cell chips. Each of these solar cells consisted of six voltage-generating unit cells monolithically connected in series and fabricated on a 75-micron-thick, p-type, single crystal, silicon substrate. A contact photolithic process employing five photomask levels together with a standard microelectronics batch-processing technique were used to construct the solar-cell chip. The open-circuit voltage increased rapidly with increasing illumination up to 5 AM1 suns where it began to saturate at the sum of the individual unit-cell voltages at a maximum of 3.0 V. A short-circuit current density per unit cell of 240 mA/sq cm was observed at 10 AM1 suns.

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BibTeXRIS

Kapoor, V. J., Valco, G. J., Skebe, G. G., Evans, J. C., Jr.. 1985-02-15. High-voltage solar-cell chip. https://ntrs.nasa.gov/citations/19850042517

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