NASA NTRS · 19820012385
Automated semiconductor diffusion and oxidation facility
Abstract
A semiconductor diffusion and oxidation facility (totally automated) was developed. Wafers arrived on an air track, automatically loaded into a furnace tube, processed, returned to track, and sent on to the next process. The entire process was controlled by a computer.
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1982-01-01. Automated semiconductor diffusion and oxidation facility. https://ntrs.nasa.gov/citations/19820012385
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