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NASA NTRS ยท 19790012312

Large Area Silicon Sheet by EFG

Abstract

Progress made in the development of EFG ribbon growth is discussed. Specific areas covered include: (1) demonstration of multiple growth for ribbons 5 cm wide in runs of 12 and 20 hours duration; (2) a single cartridge crystal growth station was built expanding observational capacity by virtue of an anamorphic optical-video system which allows close observation of the meniscus over 7.5 cm wide, as well as video taping of the ribbon growth process; (3) growth station no.1 achieved reproducible and reliable growth of 7.5 cm wide ribbon at speeds up to 4 cm/min; (4) introduction of the 'mini cold shoe'; (5) increases in cell efficiency due to interface shaping using the 'displaced die' concept; and (6) clarification of the role of gaseous impurities in cartridge furnaces and stabilization of their destabilizing influence on growth.

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BibTeXRIS

Wald, F. V.. 1979-02-16. Large Area Silicon Sheet by EFG. https://ntrs.nasa.gov/citations/19790012312

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