Plasma cleaning device

Abstract

High vacuum cleaning of contaminated surfaces such as hydrocarbon containment films can be accomplished by a plasma cleaning device which includes a plasma discharge housing to permit generation of a plasma in an environment having a higher pressure than the surface which is to be cleaned. A ground electrode and a radio frequency electrode partially surround a quartz plasma tube, for the introduction of an ionizable gas. These electrodes ionize the gas and help generate the plasma. This plasma flows through a non-constrictive aperture, through the plasma discharge housing and then on to the contaminated surface.