NASA NTRS · 19760000582
Crystal orientation for solid-state photolithography
Abstract
Method determines desirable direction to apply photoresist mask when fabricating semiconductor lasers. Method can be applied to finished wafer without affecting device yield.
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Marinelli, D. P.. 1977-03-01. Crystal orientation for solid-state photolithography. https://ntrs.nasa.gov/citations/19760000582
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