NASA NTRS · 19730012013
Light intensity strain analysis
Abstract
A process is described for the analysis of the strain field of structures subjected to large deformations involving a low modulus substrate having a high modulus, relatively thin coating. The optical properties of transmittance and reflectance are measured for the coated substrate while stressed and unstressed to indicate the strain field for the coated substrate.
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Williams, J. G.. 1973-02-13. Light intensity strain analysis. https://ntrs.nasa.gov/citations/19730012013
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