NASA NTRS · 19710024940
Profiling procedures. 1: Anodic oxidation. 2: OLS profile program
Abstract
Instructions for use of anodic oxidation apparatus in conjunction with computer program to obtain electrically active concentration profiles of doped silicon wafers
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Motamedi, H. M.. 1971-01-01. Profiling procedures. 1: Anodic oxidation. 2: OLS profile program. https://ntrs.nasa.gov/citations/19710024940
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