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NASA NTRS · 19660008886

Radiation-resistant device phenomena

Follmer, W. C.·Spratt, J. P.

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Abstract

Electrical properties of reactively evaporated aluminum oxide films and electron mean free path through metal film

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ELECTRIC PROPERTY METAL FILM ELECTRON ALUMINUM OXIDE MEAN FREE PATH

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Follmer, W. C., Spratt, J. P.. 1966-03-01. Radiation-resistant device phenomena. https://ntrs.nasa.gov/citations/19660008886

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