NASA NTRS · 19650000276
Modified developer increases line resolution in photosensitive resist
Abstract
Standard developer solution is mixed with dipropyl carbonate. This reduces swelling in the photosensitive resist and permits application of relatively thick films with minimal pinhole formation and increased line resolution.
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1965-09-01. Modified developer increases line resolution in photosensitive resist. https://ntrs.nasa.gov/citations/19650000276
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