@misc{indiciae94c26eb353c4,
  title = {Recent progress in atomic-scale controlled plasma processing},
  author = {Ishikawa, Kenji [Nagoya Univ. (Japan)] (ORCID:0000000282886620) and Nguyen, Thi-Thuy-Nga [Nagoya Univ. (Japan)] (ORCID:0000000221702488) and Inoue, Kenichi [Nagoya Univ. (Japan)] (ORCID:000000015553944X) and Osonio, Airah P [Nagoya Univ. (Japan)] (ORCID:0000000263839669) and Nguyen, Tran Trung [Nagoya Univ. (Japan)] and Tsutsumi, Takayoshi [Nagoya Univ. (Japan)] (ORCID:0000000154291606) and Li, Lan [Boise State Univ., ID (United States)] (ORCID:0000000338708437) and Shinoda, Kazunori [Hitachi High-Tech Corp., Tokyo (Japan)] and Song, Mi-Young [Korea Institute of Fusion Energy (KFE), Gunsan (Korea, Republic of). Institute of Plasma Technology] and Choi, Yong Sup [Korea Institute of Fusion Energy (KFE), Gunsan (Korea, Republic of). Institute of Plasma Technology] (ORCID:0000000218934675) and Kaganovich, Igor [Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)] (ORCID:0000000306535682) and Raitses, Yevgeny [Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)] (ORCID:0000000293829963)},
  year = {2026},
  doi = {10.35848/1347-4065/ae65a4},
  url = {https://www.osti.gov/biblio/3374930},
  note = {Source identifier: 3374930}
}