TY  - RPRT
TI  - Binary pseudo-random array standard for extreme ultraviolet lithography tool characterization
AU  - Benk, Markus [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)]
AU  - Yamada, Kaito [HighRi Optics, Oakland, CA (United States)]
AU  - Chao, Weilun [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)]
AU  - Lacey, Ian [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)]
AU  - Yashchuk, Valeriy [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)]
AU  - La Fontaine, Bruno [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)]
AU  - Takacs, Peter [Surface Metrology Solutions, Minneapolis, MN (United States)]
AU  - Rochester, Simon [Rochester Scientific, LLC, El Cerrito, CA (United States)]
AU  - Munechika, Keiko [HighRi Optics, Inc., Oakland, CA (United States)]
PY  - 2026
DO  - 10.1117/1.oe.65.1.014102
UR  - https://www.osti.gov/biblio/3024370
ID  - 3024370
ER  -