@misc{indiciae24b681874a5e,
  title = {A Reduced-Temperature Process for Preparing Atomically Clean Si(100) and SiGe(100) Surfaces with Vapor HF},
  author = {Peña, Luis Fabián [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States); University of New South Wales, Sydney, NSW (Australia)] and Anderson, Evan M. [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] (ORCID:0000000237713085) and Mudrick, John P. [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] and Rosenberg, Samantha G. [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States); Lockheed Martin Space, Palo Alto, CA (United States)] and Scrymgeour, David A. [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] (ORCID:0000000185709841) and Bussmann, Ezra [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] and Misra, Shashank [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)]},
  year = {2025},
  doi = {10.1021/acs.jpcc.5c00280},
  url = {https://www.osti.gov/biblio/2566655},
  note = {Source identifier: 2566655}
}