TY  - RPRT
TI  - Plasma sources for advanced semiconductor applications
AU  - Versolato, Oscar [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Vrije Univ., Amsterdam (Netherlands)] (ORCID:0000000171226283)
AU  - Kaganovich, Igor [Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)] (ORCID:0000000306535682)
AU  - Bera, Kallol [Applied Materials, Inc., Santa Clara, CA (United States)] (ORCID:0000000299488098)
AU  - Lill, Thorsten [Lam Research Corporation, Fremont, CA (United States)] (ORCID:0000000186685247)
AU  - Lee, Hyo-Chang [Korea Aerospace University, Goyang (Korea, Republic of)] (ORCID:0000000327541512)
AU  - Hoekstra, Ronnie [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Univ. of Groningen (Netherlands)] (ORCID:0000000186323334)
AU  - Sheil, John [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Vrije Univ., Amsterdam (Netherlands)] (ORCID:0000000333939658)
AU  - Nam, Sang Ki [Samsung Electronics Corp. (Korea, Republic of)] (ORCID:0000000230382922)
PY  - 2024
DO  - 10.1063/5.0247819
UR  - https://www.osti.gov/biblio/2496686
ID  - 2496686
ER  -