TY  - RPRT
TI  - Area-selective atomic layer deposition enabled by competitive adsorption
AU  - Suh, Taewon (ORCID:0000000163823811)
AU  - Yang, Yan
AU  - Sohn, Hae Won
AU  - DiStasio, Jr., Robert A. (ORCID:000000032732194X)
AU  - Engstrom, James R. (ORCID:0000000185058188)
PY  - 2020
DO  - 10.1116/6.0000497
UR  - https://www.osti.gov/biblio/1708925
ID  - 1708925
ER  -