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Sirbu, Dan

Publications and source records attributed to Sirbu, Dan.

20 records · Page 2

Scaling Relation for Occulter Manufacturing Errors

An external occulter is a spacecraft own along the line-of-sight of a space telescope to suppress starlight and enable high-contrast direct imaging of exoplanets. The shape of an external occulter must be specially designed to optimally suppress starlight and deviations from the ideal shape due to manufacturing errors can result loss of suppression in the shadow. Due to the long separation distances and large dimensions involved for a space occulter, laboratory testing is conducted with scaled versions of occulters etched on silicon wafers. Using numerical simulations for a flight Fresnel occulter design, we show how the suppression performance of an occulter mask scales with the available propagation distance for expected random manufacturing defects along the edge of the occulter petal. We derive an analytical model for predicting performance due to such manufacturing defects across the petal edges of an occulter mask and compare this with the numerical simulations. We discuss the scaling of an extended occulter test-bed.

Sirbu, Dan↗

Exoplanet Coronagraph Shaped Pupil Masks and Laboratory Scale Star Shade Masks: Design, Fabrication and Characterization

Star light suppression technologies to find and characterize faint exoplanets include internal coronagraph instruments as well as external star shade occulters. Currently, the NASA WFIRST-AFTA mission study includes an internal coronagraph instrument to find and characterize exoplanets. Various types of masks could be employed to suppress the host star light to about 10 -9 level contrast over a broad spectrum to enable the coronagraph mission objectives. Such masks for high contrast internal coronagraphic imaging require various fabrication technologies to meet a wide range of specifications, including precise shapes, micron scale island features, ultra-low reflectivity regions, uniformity, wave front quality, achromaticity, etc. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks by combining electron beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each, highlighting milestone accomplishments from the High Contrast Imaging Testbed (HCIT) at JPL and from the High Contrast Imaging Lab (HCIL) at Princeton University. We also present briefly the technologies applied to fabricate laboratory scale star shade masks.

black silicon↗