On control of stresses in silicon web growth
It has been observed that the residual stresses and dislocations during the silicon crystal growth for photovoltaic applications are caused by thermal stresses. The temperatures along the boundaries of the silicon crystal ribbon are prescribed to meet the requirements of the crystal growth. It is shown that by allowing the temperatures to satisfy a second-order partial differential equation in the ribbon, all thermal stresses, and others induced by them, may be eliminated for the stress-free growth of the silicon crystal.
Utku, S.↗