Disturbance reduction system: testing technology for precision formation control
The Disturbance Reduction System (DRS) is a space technology demonstration within NASA's New Millenium Program.
Engineering topics
Publications and source records attributed to Prakash, S..
The Disturbance Reduction System (DRS) is a space technology demonstration within NASA's New Millenium Program.
Temperature measurements of Mo-Si-based thin-film resistance thermometers were studied. Annealing in an argon ambient at a temperature above 1000 C for at least 1 h is required to form the stable tetragonal MoSi2 phase. With a crack-free 2-micron-thick AlN barrier layer on top, a sensor was tested up to 1200 C. The resistivity vs temperature characteristic shows the room temperature resistivity and temperature coefficient of resistivity (TCR) of the sensor to be approximately 350 microohm and 0.01195 K, respectively. No film adhesion problems were observed for at least four testing cycles.
The erosion and corrosion of thermocouples used to measure the temperature in turbine engines are studied. Structural and metallurgical interactions and instabilities at thermocouple interfaces are analyzed. Consideration is given to the adhesion, dielectric quality, surface topography, and hardness of the thermal oxides; it is observed that the structural and thermoelectric stability of thin-film thermocouple elements depends on adhesion, surface topography, and dielectric strength. The electrical conductivity and impurity content of the oxide scale are evaluated. Methods for improving the adhesion of thermocouples on the alumina surfaces are described. Compositional inhomogeneities in the sensors and contamination of the thermocouple elements are examined. The fabrication of the thermocouples is discussed. It is noted that Al2O3 and Si3N4 are useful for developing stable thermocouple elements on the surface of the blades and vanes.
The effect of pretreatments on the morphology and properties of aluminum oxide thermally grown from NiCoCrAlY was investigated. The goal was to optimize process steps to produce a highly adherent, continuous, and insulating aluminum oxide. Two pretreatments were carried out, one in vacuum (about 0.0001 Torr) at 1350 K for 5 h, and the other consisting of deposition of a 1-micron thick Al2O3 film by activated reactive evaporation. Samples were subsequently oxidized thermally at 1000 C for 50 h at 0.5 Torr oxygen pressure. The two pretreatments were carried out on electron-beam evaporation NiCoCrAlY, about 120 microns thick, deposited on a superalloy turbine blade substrate. The results showed that the thermally grown oxide was significantly different in microstructure, surface topography and in its adherence to the NiCoCrAlY for the two pretreatments. Optimum results were obtained by combining the two pretreatments to produce an adherent, continuous, and insulating oxide film on the NiCoCrAlY-coated superalloy substrate.
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