Ultra-pure nickel for structural components of low-radioactivity instruments
The next generation of nuclear and particle physics rare-event search experiments demand structural materials combining ultra-low levels of radioactive contamination with exceptional mechanical strength. Here, this study evaluates chemical vapor deposition (CVD) nickel as a low radioactive background candidate structural material for such applications. Manufacturer-supplied CVD Ni grown on aluminum substrates was assayed via inductively coupled plasma mass spectrometry (ICP-MS) employing isotope-dilution. These material assays produced measured bulk concentration of 232 Th, 238 U, and nat K at the levels of ~70 ppq, ≲100 ppq, and ~900 ppt, respectively, which is the lowest reported in nickel. Surface-etch profiling uncovered higher concentrations of these contaminants extending ~10 μ m beneath the surface, likely associated with the aluminum growth substrate. Additionally, the CVD Ni underwent tensile testing alongside standard Ni samples. CVD Ni exhibited a planar tensile strength of ~600 MPa, significantly surpassing standard nickel. However, heat treatment was found to reduce the tensile strength to levels comparable to standard Ni, with implications for high-temperature weld joining methods. The results reported are compared to the one other well documented usage of CVD Ni in a low radioactive background physics research experiment and a discussion is provided on how the currently reported results may arise from changes in CVD fabrication or testing process. These results establish CVD Ni as a promising low-radioactivity structural material, while outlining the need for further development in surface cleaning and weld-joining techniques to fully realize its potential in large-scale, low radioactive background rare-event search experiments.