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Orient, O. J.

Publications and source records attributed to Orient, O. J..

35 records · Page 2

Reaction and electronic excitation in crossed-beams collisions of low-energy O(3P) atoms with H2O and CO2

Collisions of low-energy (5-20 eV), ground-state oxygen atoms with H2O and CO2 in a crossed-beams geometry lead to chemical reaction in the case of H2O to produce OH (A2Sigma+ - X2Pi) emissions; and to inelastic electronic excitation in the case of CO2 to produce CO2 flame bands. Species identifications are made through known wavelengths and emission intensities in the range 300-400 nm. The measured difference in threshold energies for the two processes confirm the channels involved. These are the first measurements in this energy range of optical emissions through collisions of fast neutral species.

Orient, O. J.

Recombination reactions of 5-eV O(3P) atoms on a MgF2 surface

A source of hyperthermal, ground-state, impurity-free, atomic oxygen of an energy variable in the range 2-100 eV has been developed. Experimental results are presented of emission spectra in the wavelength range 250-850 nm produced by collisions of 5-eV O(3P) atoms with adsorbed NO and CO molecules on a MgF2 surface.

Orient, O. J.

Experimental investigations of low-energy (4 to 40 eV) collisions of O(-)(P2) ions and O(P3) atoms with surfaces

Using a newly-developed, magnetically confined source, low-energy, ground state oxygen negative ions and neutral atoms are generated. The energy range is variable, and atom and neutrals have been generated at energies varying from 2 eV to 40 eV and higher. It was found that the interaction of these low-energy species with a solid magnesium fluoride target leads to optical emissions in the (at least) visible and infrared regions of the spectrum. Researchers describe y details of the photodetachment source, and present spectra of the neutral and ion glows in the wavelength range 250 to 850 nm (for O(-)) and 600 to 850 nm (for O), and discuss the variability of the emissions for incident energies between 4 and 40 eV.

Chutjian, A.

Experimental investigations of low-energy (4-40 eV) collisions of O-(2P) ions and O(3P) atoms with surfaces

Using a newly-developed, magnetically confined source, low-energy, ground state oxygen negative ions and neutral atoms are generated. The energy range is variable, and atom and neutrals have been generated at energies varying from 2 eV to 40 eV and higher. It was found that the interaction of these low-energy species with a solid magnesium fluoride target leads to optical emissions in the (at least) visible and infrared regions of the spectrum. Researchers describe y details of the photodetachment source, and present spectra of the neutral and ion glows in the wavelength range 250 to 850 nm (for O/-/) and 600 to 850 nm (for O), and discuss the variability of the emissions for incident energies between 4 and 40 eV.

Orient, O. J.

Comparison of experimental and calculated attachment rate constants for CFCl3 and CCl4 in the temperature range 294-500 K

Electron-attachment cross sections and rate constants have been measured and calculated for the dissociative attachment processes e + CFCl3 - Cl(-) + CFCl2 and e + CCl4 - Cl(-) + CCl3. Good agreement over the electron-energy range 1-200 meV is found in energy dependence between present calculated cross sections and experimental cross sections at 300 K. The same calculation, with suitable adjustment of thermal populations, was used to calculate electron-attachment rate constants in the range 50-600 K. Experimental rate constants for CFCl3 and CCl4 were measured at temperatures of 294, 404, and 496 K (CFCl3) and 294, 400, and 500 K (CCl4) using the Cavalleri electron-density sampling method. Good agreement is found between present measurements and calculations, poor agreement with flowing-afterglow Langmuir-probe (FALP) data in CFCl3 at the higher temperatures, and reasonable agreement with FALP data for CCl4.

Orient, O. J.

Oxidation of silicon with a 5 eV O(-) beam

A silicon wafer has been oxidized at room temperature in vacuum using a pure, ground-state beam of O(-) ions. The beam was of sufficiently low energy that no displacement damage or implantation was energetically possible. The resulting SiO2 films were analyzed with X-ray photoelectron spectroscopy. A logarithmic dependence of oxide thickness on dose was observed, with an extrapolated oxidation efficiency of unity for the clean silicon surface. A distinct initial oxidation phase was observed, with an anomalously high level of silicon suboxides. In addition, the valence-band offset between the silicon and the oxide was unusually small, suggesting a large interfacial dipole.

Hecht, M. H.

Effects on H(-) production in a multicusp ion source by mixture of H2 with H2O, NH3, CH4, N2H4, and SF6

Effects of H(-) production in a multicusp ion source are measured by separately mixing with hydrogen small amounts (0.33-10 percent) of water, ammonia, methane, and hydrazine these are molecules which produce large amounts of H(-) via dissociative attachment (DA) resonances at higher electron energies. The mixing was done in a separate reservoir, with careful measurement of individual pressures. Experimental enhancements of 1.4 and less were observed, whereas calculated enhancements, using accurate DA cross sections for ground-state H2, should have produced factors of 1.5, 3.0, 1.3, and 2.4 enhancements for water, ammonia methane, and hydrazine, respectively, at a mean electron energy of 1.0 eV in the extraction region. The difference is accounted for by including, in the enhancement calculation, vibrationally and rotationally excited H2 molecules, with v-double prime = 5-11, and J-double prime = 0-5, and the large DA cross sections for the excited H2 (v-double prime, J-double prime). The relative populations of H2 (v-double prime, J-double prime) thus obtained are found to be substantially smaller than those predicted by theoretical calculations. The effect on H(-) current was also studied by mixing small amounts of SF6 with H2. A 1.5 percent mixture was found to reduce the H(-) output by one half.

Orient, O. J.

Field-Reversal Source for Negative Halogen Ions

Large zero-energy electron-attachment cross sections result in intense ion beams. Concept for producing negative halogen ions takes advantage of large cross sections at zero kinetic energy for dissociative attachment of electrons to such halogen-containing gases as SF6, CFCI3, and CCI4.

Chutjian, A.

Comparison of calculated and experimental thermal attachment rate constants for SF6 in the temperature range 200-600 K

Electron-attachment cross sections are calcualted for the process e(-) + SF6 yields SF6(-) in the energy range 1-200 meV. An electron scattering approximation is used in which diatomiclike potential energy curves near the equilibrium SF6 ground state are constructed from recent spectroscopic data. Excellent agreement is found over the entire energy range with experimental attachment cross sections at a temperature of 300 K for s-wave (l = 0) scattering. The same calculation, with appropriate adjustment of the thermal populations, is used to calculate attachment rate constants in the range 50-600 K for both s- and p-wave scattering.

Orient, O. J.

Cross sections for H(-) and Cl(-) production from HCl by dissociative electron attachment

A crossed target beam-electron beam collision geometry and a quadrupole mass spectrometer have been used to conduct dissociative electron attachment cross section measurements for the case of H(-) and Cl(-) production from HCl. The relative flow technique is used to determine the absolute values of cross sections. A tabulation is given of the attachment energies corresponding to various cross section maxima. Error sources contributing to total errors are also estimated.

Orient, O. J.

Reversal ion source - A new source of negative ion beams

A new type of ion source utilizing beams of electrons and target molecules, rather than a diffuse, volume plasma, is described. The source utilizes an electrostatic electron 'mirror' which reverses trajectories in an electron beam, producing electrons at their turning point having a distribution of velocities centered at zero velocity. A gas which attaches zero-velocity electrons is introduced at this turning point. Negative ions are produced by an attachment or dissociative attachment process. For many of the thermal electron-attaching molecules the cross sections can be quite large, varying as the inverse square root of the electron energy or just the s-wave threshold law. The efficiency and current density of the ion source for production of Cl(-) through the large, thermal energy attachment process is estimated. It is argued that the source can be used for the production of negative ions through attachment resonances located at higher energies as well.

Orient, O. J.

s-wave threshold in electron attachment - Results in 2-C4F6 and CFCl3 at ultra-low electron energies

Electron attachment lineshapes and cross sections are reported for the processes 2-C4F6(-)/2-C4F6 and Cl(-)/CFCl3 at electron energies of 0-120 and 0-140 meV, and at resolutions of 6 and 7 meV (FWHM), respectively. As in previous measurements in CCl4 and SF6, the results show resolution-limited narrow structure in the cross section at electron energies below 15 meV. This structure arises from the divergence of the s-wave cross section in the limit of zero electron energy. Comparisons are given with swarm-measured results, and with collisional ionization (high-Rydberg attachment) data in this energy range.

Chutjian, A.

Mass spectrometric determination of partial and total electron impact ionization cross sections of SO2 from threshold up to 200 eV

The partial and total ionization cross section for the formation of O(+), S(+), SO(+) and SO2(+) from the impact ionization of SO2 are reported, extending the electron impact energies to 200 eV. The relative flow technique is used to determine the cross section values. The threshold potentials for the products are 23.5 eV for O(+), 16.5 eV for S(+), 16.5 eV for SO(+), and 12.5 eV for SO2(+). Good agreement with the literature is found for SO(+) and SO2(+).

Orient, O. J.

Production of O(-) from CO2 by dissociative electron attachment

Dissociative electron attachment cross-section measurements for the production of O(-) from CO2 are performed using a crossed target-beam - electron-beam collision geometry and a quadrupole mass spectrometer. The relative flow technique is used in determining the absolute values of the cross sections. The attachment energies corresponding to the five cross-section maxima are given. They are 4.4 + or - 0.1, 8.2 + or - 0.1, 13.0 + or - 0.2, 16.9 + or - 0.2, and 19.4 + or 0.2 eV. Also given are the cross sections at these maxima: 1.43 x 10 to the -19th sq cm, 4.48 x 10 to the -19th sq cm, 8.1 x 10 to the -21st sq cm, 8.1 x 10 to the -21st sq cm, and 1.2 x 10 to the -20th sq cm, respectively.

Orient, O. J.

Production of negative ions by dissociative electron attachment to SO2

Dissociative electron attachment cross section measurements for the production of O(-), S(-), and SO(-) have been performed utilizing a crossed target SO2 molecule beam-electron beam geometry. The relative flow technique is employed to determine the absolute values of cross sections. The attachment energies corresponding to various cross section maxima are: 4.30 and 7.1 eV for O(-)/SO2; 4.0, 7.5, and 8.9 eV for S(-)/SO2, and 4.7 and 7.5 eV for SO(-)/SO2.

Orient, O. J.

Elastic scattering of electrons from SO2

A crossed electron beam-molecular beam scattering geometry and the relative-flow technique are used to measure the ratios of the elastic differential cross sections of SO2 to those of He at electron impact energies of 12, 20, 50, 100, 150, and 200 eV. At each energy, an angular range of 15-150 deg is covered. The ratios are multiplied by previously known He elastic differential cross sections to obtain elastic differential cross sections for SO2. Integral and momentum transfer cross sections are then determined from a knowledge of differential cross sections. With the aid of the two-potential theory of e-molecule scattering, calculations are also performed and compared with the measurements.

Orient, O. J.

Cross section for Ly-alpha emission by electron impact on methane

Utilizing Lyman-alpha emission cross sections for H2 as secondary standards, absolute values of Lyman-alpha emission cross sections for CH4 have been obtained for electron impact energies varying from threshold to 100 eV. A crossed electron beam-molecular beam geometry was employed and the Lyman-alpha radiation was detected at 90 deg and 45 deg with respect to the incident electron beam by a solar blind photomultiplier in tandem with an oxygen filter. The results are compared with previous measurements. Appreciable differences among the various experimental data are found.

Orient, O. J.