Engineering topics

Nakhoda, Kashmira

Publications and source records attributed to Nakhoda, Kashmira.

3 records

DOE OSTI2022

Measurement Uncertainty of Highly Asymmetrically Curved Elliptical Mirrors Using Multi-Pitch Slope Stitching Technique

Soft X-ray off-axis elliptical mirrors bring new challenges for X-ray mirror metrology. These highly asymmetrically curved elliptical cylindrical mirrors with a total slope range >10 mrad are extremely challenging to measure. Their total slope range exceeds the measuring range of most angular sensors used for X-ray mirror inspection. To overcome this problem, it is possible to stitch partial slope data by measuring the mirror at different pitch angles (multi-pitch angles). By revisiting the theory of the multi-pitch Nano-accuracy Surface Profiler (NSP), we derive the sampling position error on the mirror surface as a function of the mirror height profile and the measurement error of the pitch rotation center. When measuring “extreme”, highly asymmetrically curved, elliptical mirrors, the calculation of the mirror height profile with iterative reconstruction outperforms the classical “flat assumption” (i.e., assuming that the mirror sag is negligible). As demonstrated by our simulations, a proper tolerance evaluation on the measurement of pitch rotation center is needed to assess the measurement accuracy (systematic error) for these strongly aspherical mirrors using the multi-pitch NSP technique. Taking a real design of an “extreme” elliptical mirror as a case study, we conduct a Monte Carlo simulation to mimic the measurement and characterization process to analyze the impact of several error sources. With the measurement uncertainty of the pitch rotation center, the multi-pitch NSP measurement can estimate the grazing angle θ and the chief ray location x o with their uncertainties, as well as the slope residuals.

36 MATERIALS SCIENCE↗

DOE OSTI2022

Compact instantaneous phase-shifting Sagnac interferometer for nanoscale tilt measurement

There is a large inter disciplinary need for high precision angular sensors in state-of-the-art technologies. This particularly applies to optical metrology in the field of Extreme Ultraviolet (EUV) or X-ray where the optics are commonly characterized in terms of slope errors at a nanoradian scale level. Here, in this paper, we present the in-lab development of an angular sensor based on a single reflection compact Sagnac interferometer using instantaneous phase shifting. Our automated prototype and first results show less than 15 nrad RMS repeatability, at least 200 nrad sensitivity and 280 nrad reproducibility over 100 μrad angular range.

36 MATERIALS SCIENCE↗

DOE OSTI2021

Universal dwell time optimization for deterministic optics fabrication

Computer-Controlled Optical Surfacing (CCOS) has been greatly developed and widely used for precision optical fabrication in the past three decades. It relies on robust dwell time solutions to determine how long the polishing tools must dwell at certain points over the surfaces to achieve the expected forms. However, as dwell time calculations are modeled as ill-posed deconvolution, it is always non-trivial to reach a reliable solution that 1) is non-negative, since CCOS systems are not capable of adding materials, 2) minimizes the residual in the clear aperture 3) minimizes the total dwell time to guarantee the stability and efficiency of CCOS processes, 4) can be flexibly adapted to different tool paths, 5) the parameter tuning of the algorithm is simple, and 6) the computational cost is reasonable. In this study, we propose a novel Universal Dwell time Optimization (UDO) model that universally satisfies these criteria. First, the matrix-based discretization of the convolutional polishing model is employed so that dwell time can be flexibly calculated for arbitrary dwell points. Second, UDO simplifies the inverse deconvolution as a forward scalar optimization for the first time, which drastically increases the solution stability and the computational efficiency. Finally, the dwell time solution is improved by a robust iterative refinement and a total dwell time reduction scheme. The superiority and general applicability of the proposed algorithm are verified on the simulations of different CCOS processes. A real application of UDO in improving a synchrotron X-ray mirror using Ion Beam Figuring (IBF) is then demonstrated. The simulation indicates that the estimated residual in the 92.3 mm × 15.7 mm CA can be reduced from 6.32 nm Root Mean Square (RMS) to 0.20 nm RMS in 3.37 min. After one IBF process, the measured residual in the CA converges to 0.19 nm RMS, which coincides with the simulation.

36 MATERIALS SCIENCE↗