Engineering topics
Publications and source records attributed to Mangolini, Lorenzo.
The 2024 Plasma Processing Science GRC and GRS took place from July 20, 2024 through July 26, 2024 at the Proctor Academy in Andover, New Hampshire.
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The overall objective of this project is to advance the understanding of the interaction between low-pressure plasmas and nanoparticles uniformly dispersed within them. In particular we aim at (OBJECTIVE 1) providing a Langmuir probe measurement of the electron energy distribution function in a dusty plasma and (OBJECTIVE 2) investigating the influence that plasmonic nanoparticles have on the properties of non-thermal plasmas. This work is well aligned with the DOE-FES “General Plasma Science Experiment and Theory” program and with topics such as “dusty, non-neutral and antimatter plasmas” and “advanced plasma diagnostic”. The proposed project, while based on the PI’s expertise in the non-thermal plasma processing of nanoparticles, will allow the PI to deepen his knowledge in the area of basic plasma physics and diagnostics, and will support the development of his research program, in line with the scope of the Early Career program.
Abstract The use of a low‐temperature plasma for the synthesis of amorphous silicon carbonitride (SiCN) nanoparticles enables the realization of sintered bulk samples with high thermal stability. Amorphous SiCN nanoparticles are produced from a mixture of silane, methane, and ammonia utilizing a mid‐pressure, radio‐frequency, continuous flow reactor. Particle characterization shows that the nanoparticles are largely amorphous with some crystalline silicon and silicon carbide domains <10 nm in size. Compositional tuning, controlled by varying the precursor flow rates, coupled with the uniform mixing of elements at the nanoscale, results in samples that resist crystallization even when sintered at temperatures as high as 2000°C. This study suggests that the low‐temperature plasma synthesis of nanoparticles has great potential to produce bulk structural materials for application in harsh environments.
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