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Lerner, Narcinda R.

Publications and source records attributed to Lerner, Narcinda R..

10 records
All sourcesNASA NTRSDOE OSTI
NASA NTRS1997

Deuterium Enrichment of Amino and Hydroxy Acids Found in the Murchison Meteorite: Constraints on Parent Body Conditions

The alpha-amino and alpha-hydroxy acids found in the Murchison carbonaceous chondrite are deuterium enriched. These compounds are thought to have originated from common deuterium enriched carbonyl precursors, by way of a Strecker synthesis which took place in a solution of HCN, NH3, and carbonyl compounds during the period of aqueous alteration of the meteorite parent body. However, the hydroxy acids found on Murchison are less deuterium enriched than the amino acids. With the objective of determining if the discrepancy in deuterium enrichment between the amino acids and the hydroxy acids found on Murchison is consistent with their formation in a Strecker synthesis, we have measured the deuterium content of alpha-amino and alpha-hydroxy acids produced in solutions of deuterated carbonyl compounds, KCN and NH4Cl, and also in mixtures of such solutions and Allende dust at 263 K and 295 K. Retention of the isotopic signature of the starting carbonyl by both alpha amino acids and alpha hydroxy acids is more dependent upon temperature, concentration and pH than upon the presence of meteorite dust in the solution. The constraints these observations place on Murchison parent body conditions will be discussed.

Lerner, Narcinda R.↗
NASA NTRS1996

Products of the Strecker Synthesis as Indicators of Parent Body Conditions of the Murchison Meteorite

The Strecker synthesis, R2C=O + HCN + NH3 yields R2C(NH2)CN + H2O yields R2C(NH2)CO2H has been proposed as a source of amino acids in meteorites. The detection of carbonlyl compounds, the precursors of the amino acids in the Strecker synthesis, and a-hydroxy acids, important by-products of the Strecker synthesis, in the Murchison meteorite supports this conjecture. However, the following observations raise questions about the Strecker synthesis as the source of a-amino and a-hydroxy acids in Murchison: a) Imino acetic acids are also important by-products of the Strecker synthesis and have not been reported in Murchison. b) a-aminisobutyric acid (AIBA) is one of the most abundant amino acids in Murchison but the Strecker synthesis conducted at room temperature produced only small amounts of AIBA relative to other amino acids. c) If the a-amino and a-hydroxy acids observed in Murchison arose from a common precursor this ought to be reflected in their relative abundances, but the straight chain a-hydroxy acids appeared to be relatively abundant compared with the analogous a-amino acids. In order to address question a) we have examined a non-hydrolyzed aqueous extract of the Murchison meteorite. Imino di acetic acid, Imino propionic acetic acid and Imino butyric acetic acid (both isomers) have been identified in this fraction. The relative abundances of amino acids and imino acetic acids in this fraction are consistent with a Strecker synthesis at low temperature (263 K) as a origin of both the amino acids and the imino acetic acids found on Murchison. To deal with questions b) and c) we have carried out laboratory simulations of the Strecker synthesis. The starting concentrations for carbonlyl compounds used were based on estimates of what these concentrations might have been on the parent body. for the carbonyl compounds this estimate was determined by the amount of carbonyl compound found on Murchison plus the amounts of the corresponding amino acid and hydroxy acid found on Murchison and the rock to water ratio estimated by Clayton and Mayeda (1984). The cyanide concentration was that estimated by Peltzer et al. (1984). The ammonia concentration and pH were varied. We studied these mixtures at 298 K and 263 K. We found that high relative abundances of AIBA were produced at 263 K but not at 298 K. We only produced a-methyl a-amino hydroxy acids at 263 K with no initial ammonia. The abundances of a-amino acids, a-hydroxy acids and imino acids found on Murchison are consistent with a Strecker synthesis which took place at low temperature and with a low concentration of ammonia.

Lerner, Narcinda R.↗
NASA NTRS1994

Aqueous Phase Non Enzymatic Chemistry of Cyanide, Formaldehyde and RNH2

It is postulated that amino acids were produced on the early earth from dilute aqueous solution of cyanide, carbonyls and ammonia (the Strecker synthesis RNH2 + R"R""C=O + KCN yields H-N(R)-C(R")(R"")-CO2H. We have studied the products obtained from dilute aqueous solutions of cyanide, formaldehyde (R"=R""=H), ammonia (R=H) and amino acids. Solutions in the pH range from 8 to 10. at room temperature and at reactant concentrations from 0.001 M to 0.3 M have been studied. With R= H product yields were low (less than 3%). Only with R"=R""=H and R represented by the following: CH2CO2H (glycine); CH(CH3)CO2H (alanine); CH(CH2CH3)CO2H (a-amino n=butyric acids); C(CH3)2(CO2H) (a-aminoisobutyric acid); CH(CH(CH3)2)CO2H (valine); and CH(CH2CO2H)CO2H (aspartic acid), were product yields high (greater than 10%). The yields of glycine were larger with R not equal to H. The prebiotic implications of these findings will be discussed.

Lerner, Narcinda R.↗
NASA NTRS1992

Degradation Of Fluoropolymers by O(3P)

Three reports describe experimental studies of degradation of some fluoropolymers (and few nonfluorinated polymers) by monatomic oxygen in 3P state. Studies motivated by need to develop polymeric coats to protect some components of spacecraft against highly reactive O(3P) atmosphere at typical low Earth orbital altitudes. Results indicate fully fluorinated polymers most resistant to oxidation, while cross-linked (but otherwise fully fluorinated) fluoropolymers most resistant to etching.

Wydeven, Theodore↗
NASA NTRS1991

Rapid Dry Etching Of Photoresists Without Toxic Gases

Experimental dry etching technique strips photoresists from semiconductor wafers without damaging semiconductor materials. Makes use of afterglow existing downstream from plasma generated by radio-frequency electric field. Constituents of afterglow react with sacrificial polymer to make reactive gases that quickly etch-away photoresist. Strips quickly at room temperature; not necessary to heat substrates. No hazardous or toxic chemicals used.

Lerner, Narcinda R.↗
NASA NTRS1991

Etching method for photoresists or polymers

A method for etching or removing polymers, photoresists, and organic contaminants from a substrate is disclosed. The method includes creating a more reactive gas species by producing a plasma discharge in a reactive gas such as oxygen and contacting the resulting gas species with a sacrificial solid organic material such as polyethylene or polyvinyl fluoride, reproducing a highly reactive gas species, which in turn etches the starting polymer, organic contaminant, or photoresist. The sample to be etched is located away from the plasma glow discharge region so as to avoid damaging the substrate by exposure to high energy particles and electric fields encountered in that region. Greatly increased etching rates are obtained. This method is highly effective for etching polymers such as polyimides and photoresists that are otherwise difficult or slow to etch downstream from an electric discharge in a reactive gas.

Lerner, Narcinda R.↗
NASA NTRS1991

Reactions Of Atomic Oxygen {O(3P)} With Polybutadienes

Report describes experimental study of chemical reactions of atomic oxygen in ground state {O(3P)} with polybutadienes and related polymers. Attention focused on such reactions because of adverse effects of environmental atomic oxygen on polymeric materials in low orbits around Earth.

Golub, Morton A.↗
NASA NTRS1991

A conformal oxidation-resistant, plasma-polymerized coating

A comparative study was made of the surface recession (etching) of thin films of plasma polymerized tetrafluoro ethylene (PPTFE), polytetrafluoro ethylene (PTFE), and ion-beam sputter deposited polytetrafluoro ethylene (SPTFE) exposed to ground-state atomic oxygen downstream from a nonequilibrium radio-frequency O2 plasma. At 22 C, the etch rates for PTFE, SPTFE, and PPTFE were in the ratio of 8.7:1.8:1.0. A thin, conformal coating of PPTFE (etch rate of 0.3 nm/h at 22 C) was found to protect an underlying cast film of a reactive polymer, cis-1,4 polybutadiene, against ground-state atomic oxygen attack for the time required to fully etch away the PPTFE coating. From ESCA analysis, PTFE exhibited only minor surface oxidation (uptake of 0.5 atom percent O) upon etching, its F/C ratio decreasing slightly from 2.00 to 1.97; PPTFE exhibited considerable surface oxidation (uptake of 5.9 atom percent O) intermediate between those of PTFE and PPTFE, with a decrease in F/C ratio from 1.73 to 1.67. A plasma-polymerized fluorocarbon coating such as PPTFE might be useful for space applications to protect polymers that are vulnerable to oxidation or degradation by oxygen atoms.

Golub, Morton A.↗
NASA NTRS1987

Reactions of Atomic Oxygen (O(3P)) with Polybutadienes and Related Polymers

Thin films of the following polymers were exposed at ambient temperature to ground-state oxygen atoms (O(3P)), generated by a radio-frequency glow discharge in O2: cis- and trans-1,4-polybutadienes (CB and TB), amorphous 1,2-polybutadiene (VB), polybutadienes with different 1,4/1,2 contents, trans polypentenamer (TP), cis and trans polyoctenamers (CO and TO), and ethylene-propylene rubber (EPM). Transmission infrared spectra of CB and TB films revealed extensive surface recession, or etching, unaccompanied by any microstructural changes within the films, demonstrating that the reactions were confined to the surface layers. Contrary to the report by Rabek, Lucki, and Ranby (1979), there was no O(3P)-induced cis-trans isomerization in CB or TB. From weight-loss measurements, etch rates for polybutadienes were found to be markedly dependent on vinyl content, decreasing by two orders of magnitude from CB (2% 1,2) to structures with 30 to 40% 1,2 double bonds, thereafter increasing by half an order of magnitude to VB (97% 1,2). Relative etch rates for EMP and the polyalkenamers were in the order: EMP is greater than CO (or TO) is greater than TP is greater than CB. The sole non-elastomer examined, TB, had an etch rate about six times that of CB, ascribable to a morphology difference. Cis/trans content had a negligible effect on the etch rate of the polyalkenamers. Mechanisms involving crosslinking through units are proposed for the unexpected protection imparted to polybutadienes by the 1,2 double bonds.

Golub, Morton A.↗