Differential ion pumping for vacuum deposition.
Differential ion pumping for vacuum deposition of thin films
Leonard, W. F.↗
Engineering topics
Leonard, W. F.
Publications and source records attributed to Leonard, W. F..
Differential ion pumping for vacuum deposition
Feasibility of differential ion pumping concept for reducing pressure during vacuum deposition of thin films
Leonard, W. F.↗
Temperature coefficient of resistance in thin metal films.
Temperature coefficient of resistance in thin metal films, using Sondermayer analysis for vapor deposited Au, Ag and Cu films
ELECTRIC RESISTANCE↗
Thickness of Au, Ag, and Cu films from theoretical expressions for conductivity and isothermal Hall effect.
Thickness of gold, silver and copper thin films determined, using measurements of resistance and Hall voltage
FILM THICKNESS↗
Microwave technique measures plasma characteristics
Plasma electron density and temperature distribution are measured by passing a high frequency millimeter wave through plasma. Variations in density and temperature are determined by measuring insertion loss as the plasma travels between the microwave transmitting and receiving antennas.
Leonard, W. F.↗
Determination of plasma temperature and electron density distributions using millimeter waves
Spatial resolution in measurement of electron density and temperature variation in thermal plasma of cylindrical cross section using millimeter waves
THERMAL PLASMA↗