Oxygenates production in a microfluidic dielectric barrier discharge device sustained in Ar/CH 4 /O 2
Reforming of methane (CH 4 ) is a process to produce syngas (CO/H 2 ) and other value-added chemicals including oxygenates such as methanol (CH 3 OH). Atmospheric pressure plasmas have the potential to be more energy efficient than traditional reforming methods as value-added chemicals can be synthesized directly in the plasma without requiring an additional step. In this paper, we discuss the results from a computational investigation of the formation of oxygenates by CH 4 oxidation in the presence of Ar, including CH 3 OH and CH 2 O, in a nanosecond pulsed dielectric barrier discharge. The plasma is formed in a microfluidic channel whose small dimensions are ideal for plasma formation at atmospheric pressure. The production and consumption mechanisms of dominant radicals and long-lived species are discussed in detail for the base case conditions of Ar/CH 4 /O 2 = 50/25/25. CH 3 OH is produced primarily by CH 3 O reacting with CH 3 O and CH 3 O 2 reacting with OH, while CH 2 O formation relies on reactions involving CH 3 O and CH 3 . The most abundant oxygenate formed is CO (produced by H abstraction from CHO). However, the greenhouse gas CO 2 is also formed as a by-product. The effects of gas mixture are examined to maximize the CH 3 OH and CH 2 O densities while decreasing the CO 2 density. Increasing the Ar percentage from 0% to 95% decreased the CH 3 OH and CH 2 O densities. At low Ar percentages, this is due to an increase in consumption of CH 3 OH and CH 2 O, while at high Ar percentages (>40% Ar), the production of CH 3 OH and CH 2 O is decreased. However, both CO and CO 2 reached peak densities at 70%–90% Ar. Changing the CH 4 /O 2 ratio while keeping 50% Ar in the discharge led to increased CH 3 OH and CH 2 O production, reaching peak densities at 35%–40% CH 4 . The CO and CO 2 densities decreased beyond 20% CH 4 , indicating that a CH 4 rich discharge is ideal for forming the desired oxygenates.