Georgi Georgiev | Engineering Papers

NASA NTRS2023

New Mie Scattering Diffuse Targets Development and Characterization

Earth science remote sensing observations require the detection and measurement of light originating from bright targets, such as clouds, and darker targets, such as an open ocean. This requirement drives the need to design, develop, and characterize improved calibration targets in support of current and future NASA instruments. New diffuse targets to be used as spectral albedo calibration standards were developed and characterized. The new targets based on fused silica or/and pressed and sintered Polytetrafluoroethylene (PTFE) were developed to be Earth scene specific. The various reflectance levels are achieved by modifying the material parameters, thickness, and surface finish. The new targets were characterized in laboratory and simulated space environments. We acquired high accuracy reflectance and transmittance data using a precision optical scatterometer and spectrophotometer located in the NASA Goddard Space Flight Center (GSFC) Diffuser Calibration Lab. The Total hemispherical reflectance (THR) and Bidirectional Reflectance Distribution Function (BRDF) were measured over the range of solar incident and scattered elevation and azimuthal angles typically realized on orbit by remote sensing instruments. We intend to space certify the new calibration targets after concluding on-orbit testing on the International Space Stations (ISS) scheduled for the second half of 2023.

Georgi Georgiev↗

NASA NTRS2019

Highly Absorptive Pupil Mask Fabricated with Black Silicon

Many of NASA’s direct imaging of exoplanet missions and projects require fabricated coronagraph masks to control scattering and diffraction of light. The designed, patterned mask intended for the coronagraphic testbeds are highly absorptive in the visible range on non-metallic regions. In this work, we employed the cryogenic etching process to fabricate black silicon (BSi) to achieve a high aspect ratio (HAR) structures with higher etch rate than conventional reactive ion etching (REI). Recent bidirectional reflectance distribution function (BRDF) measurements of uniformly etched BSi on silicon wafer show highly diffusive BSi with a specular reflective component in the orders of seven magnitudes lower than the total hemispherical reflectance when the polarized or non-polarized incident beam is used.

black-silicon↗

NASA NTRS2019

Highly Absorptive Pupil Mask Fabricated with Black Silicon

Many of NASA’s direct imaging of exoplanet missions and projects require fabricated coronagraph masks to control scattering and diffraction of light. The designed, patterned mask intended for the coronagraphic testbeds are highly absorptive in the visible range on non-metallic regions. In this work, we employed the cryogenic etching process to fabricate black silicon (BSi) to achieve a high aspect ratio (HAR) structures with higher etch rate than conventional reactive ion etching (REI). Recent bidirectional reflectance distribution function (BRDF) measurements of uniformly etched BSi on silicon wafer show highly diffusive BSi with a specular reflective component in the orders of seven magnitudes lower than the total hemispherical reflectance when the polarized or non-polarized incident beam is used.

BRDF↗