Oxidation of TD nickel at 1050 and 1200 C as compared to three grades of nickel of different purity.
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Engineering topics
Publications and source records attributed to Deadmore, D. L..
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The isothermal oxidation of three nickels of different purity, Ni-200, Ni-270, and JM-Ni, was compared with that of TD-Ni in air at 1050 and 1200 C. The samples were oxidized as ground, as polished, or as annealed and polished. Weight change, metal loss, scale thickness, oxide morphology, and scale texture were determined. In degree of oxidation, TD-Ni was nearly the same as the higher purity materials, Ni-270 and JM-Ni; and less pure Ni-200 oxidized more than the others. However, in microstructure and scale texture the TD-Ni more closely resembled Ni-200. Grinding only charged the texture of the oxides of Ni_200 and TD-Ni.
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Isothermal cross section of tantalum-hafnium- carbon at high temperatures constructed from X-ray diffraction, chemical analysis, and metallographic and microhardness data
Vaporization of tantalum carbide-hafnium carbide solid solutions at high temperatures
Vaporization rates in vacuum of hot pressed hafnium carbide and tantalum carbide at 3000 deg K
Vaporization rates in vacuum of hot pressed tantalum carbide and hafnium carbide in temperature range of 2500 to 3000 deg K