Engineering topics

Bunker, S. N.

Publications and source records attributed to Bunker, S. N..

4 records

NASA NTRS1986

Solar-Cell-Junction Processing System

System under development reduces equipment costs. Processing system will produce solar-cell junctions on 4 in. (10.2 cm) round silicon wafers at rate of 10 to seventh power per year. System includes non-mass-analyzed ion implanter, microcomputer-controlled, pulsed-electron-beam annealer, and wafertransport system with vacuum interlock. These features eliminate large, expensive magnet and plates, circuitry, and power source otherwise needed for scanning.

Bunker, S. N.↗

NASA NTRS1982

Non-mass-analyzed ion implantation from a solid phosphorus source

A phosphorus ion beam, extracted from a Freeman ion source charged with elemental phosphorus, has been investigated for use in solar cell fabrication. Mass spectroscopy of the beam indicates the absence of both minority-carrier lifetime degrading impurities and hydrogen. The ion beam, without mass analysis, was used for ion implantation of solar cells, and performance for all cells was found to be equivalent to mass-analyzed controls.

Spitzer, M. B.↗

NASA NTRS1982

New implantation techniques for improved solar cell junctions

Ion implantation techniques offering improved cell performance and reduced cost have been studied. These techniques include non-mass-analyzed phosphorus implantation, argon implantation gettering, and low temperature boron annealing. It is found that cells produced by non-mass-analyzed implantation perform as well as mass-analyzed controls, and that the cell performance is largely independent of process parameters. A study of argon implantation gettering shows no improvement over non-gettered controls. Results of low temperature boron annealing experiments are presented.

Spitzer, M. B.↗

NASA NTRS1982

Non-mass-analyzed ion implantation equipment for high volume solar cell production

Equipment designed for junction formation in silicon solar cells is described. The equipment, designed for a production level of approximately one megawatt per year, consists of an ion implanter and annealer. Low cost is achieved by foregoing the use of mass analysis during the implantation, and by the use of a belt furnace for annealing. Results of process development, machine design and cost analysis are presented.

Armini, A. J.↗