Engineering topics
Bouet, Nathalie
Publications and source records attributed to Bouet, Nathalie.
A versatile high-speed x-ray microscope for high-throughput sub-10nm Imaging
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Hard x-ray imaging by scanning 2D multilayer Laue lenses
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Machine learning-aided automatic and precise focal length estimation of multilayer Laue lenses for high-resolution hard x-ray microscopy
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Simulation Study of High-Precision Characterization of MeV Electron Interactions for Advanced Nano-Imaging of Thick Biological Samples and Microchips
The resolution of a mega-electron-volt scanning transmission electron microscope (MeV-STEM) is primarily governed by the properties of the incident electron beam and angular broadening effects that occur within thick biological samples and microchips. A precise understanding and mitigation of these constraints require detailed knowledge of beam emittance, aberrations in the STEM column optics, and energy-dependent elastic and inelastic critical angles of the materials being examined. This simulation study proposes a standardized experimental framework for comprehensively assessing beam intensity, divergence, and size at the sample exit. This framework aims to characterize electron-sample interactions, reconcile discrepancies among analytical models, and validate Monte Carlo (MC) simulations for enhanced predictive accuracy. Our numerical findings demonstrate that precise measurements of these parameters, especially angular broadening, are not only feasible but also essential for optimizing imaging resolution in thick biological samples and microchips. By utilizing an electron source with minimal emittance and tailored beam characteristics, along with amorphous ice and silicon samples as biological proxies and microchip materials, this research seeks to optimize electron beam energy by focusing on parameters to improve the resolution in MeV-STEM/TEM. This optimization is particularly crucial for in situ imaging of thick biological samples and for examining microchip defects with nanometer resolutions. Our ultimate goal is to develop a comprehensive mapping of the minimum electron energy required to achieve a nanoscale resolution, taking into account variations in sample thickness, composition, and imaging mode.
Key aspects of sub-nanometer deterministic ion beam figuring for synchrotron hard x-ray mirror fabrication
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A comprehensive review of dwell time optimization methods in computer-controlled optical surfacing
Dwell time plays a vital role in determining the accuracy and convergence of the computer-controlled optical surfacing process. However, optimizing dwell time presents a challenge due to its ill-posed nature, resulting in non-unique solutions. To address this issue, several well-known methods have emerged, including the iterative, Bayesian, Fourier transform, and matrix-form methods. Despite their independent development, these methods share common objectives, such as minimizing residual errors, ensuring dwell time's positivity and smoothness, minimizing total processing time, and enabling flexible dwell positions. This paper aims to comprehensively review the existing dwell time optimization methods, explore their interrelationships, provide insights for their effective implementations, evaluate their performances, and ultimately propose a unified dwell time optimization methodology.