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Allen, T. H.

Publications and source records attributed to Allen, T. H..

Vacuum-ultraviolet reflectometer

Baffle, three-blade chopper, and split spherical mirror transmit alternating dual beam into integrating sphere. Alternating reference and sample beams are detected by high gain photomultiplier and modified logarithmic ratiometer. Device is useful in fusion research, high power laser work, and spectrometer or monochromator construction.

Allen, T. H.

Molecular beam generator

Vacuum deposition generator has nozzle and aperature designed especially for beams of heavy organic molecules. Deposition rates are from 6 to 15 angstroms per minute.

Richmond, R. G.

Study of Al with a combined Auger electron spectrometer-ellipsometer system

Auger electron spectroscopy and ellipsometry were applied in order to measure the optical constants and study the surface chemistry of vapor-deposited Al films and high-purity bulk Al surfaces in situ under vacuum. The optical constants measured were compared with the extinction coefficient computed by the free-electron theory. The contamination of the clean Al surface was in the form of a metal oxide film. Auger electron spectroscopic measurements were used to establish the relationship between the Auger peaks of O (513 eV) and aluminum oxide (53 eV) and changes in the measured optical phase and film thickness. The free path length of the Al Auger electrons (67 eV) in the oxide film was determined, and it was shown that the amplitude of these peaks is a linear function of film thickness down to 0.6 A.

Allen, T. H.

Evaluation and study of advanced optical contamination, deposition, measurement, and removal techniques

A program is described to design, fabricate and install an experimental work chamber assembly (WCA) to provide a wide range of experimental capability. The WCA incorporates several techniques for studying the kinetics of contaminant films and their effect on optical surfaces. It incorporates the capability for depositing both optical and contaminant films on temperature-controlled samples, and for in-situ measurements of the vacuum ultraviolet reflectance. Ellipsometer optics are mounted on the chamber for film thickness determinations, and other features include access ports for radiation sources and instrumentation. Several supporting studies were conducted to define specific chamber requirements, to determine the sensitivity of the measurement techniques to be incorporated in the chamber, and to establish procedures for handling samples prior to their installation in the chamber. A bibliography and literature survey of contamination-related articles is included.

Linford, R. M. F.

A study of molecular contamination

Contamination kinetics of typical space materials were studied using several techniques, including ellipsometry. Data were obtained on contaminant deposition rates, sticking coefficients, and reevaporation of the contamination. Materials studied included silicone sealants, a thermal control paint, and a graphite laminate as contaminant sources, and gold coated surfaces, a thermal control paint and a second surface mirror material as the contaminees. Both deposition and reevaporation rates were found to be nonlinear with time, and followed an exponential decay. A hypothesis is presented that the nonlinear behavior was a result of disproportionation of the molecular weight fractions of the polymers. The measured sticking coefficients were found to vary substantially with temperature over narrow ranges. Simulated space radiation was found to reduce the evaporation rates of contaminants by several orders of magnitude.

Allen, T. H.

A system for the study of molecular contamination

An experimental vacuum chambers was designed and fabricated to provide a wide range of experimental capability. This work chamber assembly (WCA) was conceived to establish the proof-of-principle of various techniques for studying the kinetics of contaminants and their effects. It incorporates the capability for depositing both optical and contaminant films on temperature-controlled samples, and for in-situ measurements of the vacuum ultraviolet reflectance. Ellipsometer optics are mounted on the chamber for film thickness determinations, and other features include access ports for radiation sources and instrumentation.

Dillow, C. F.